2008
DOI: 10.1088/0268-1242/23/8/085019
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Effects of substrate temperature on the optical and electrical properties of Al:ZnO films

Abstract: Al-doped ZnO films were grown on glass substrates by the pulsed-laser deposition technique with varying substrate temperatures. The optical band gap decreases from 3.64 to 3.46 eV as the substrate temperature increases from 350 to 450 • C, illustrating the increase in Al content in the context of a degenerate semiconductor, and can be explained in the framework of the Burstein-Moss effect. All films show optical transparency greater than 85%. Al:ZnO films show a metal-semiconductor transition to metal-like beh… Show more

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Cited by 44 publications
(28 citation statements)
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“…25 On the other hand, heating in vacuum causes widening in the energy band gap as a result of electrons release following Burstein-Moss effect. 26 It means oxygen evolution during annealing in vacuum raises the Fermi-level upwards by partially filling the conduction band gap and leads to increase in the band gap. The electrons donated by aluminum and those left behind by oxygen ions via desorption as molecules seem to be different and of opposite nature with regard to changes in the band gap.…”
Section: Optical Behaviormentioning
confidence: 99%
“…25 On the other hand, heating in vacuum causes widening in the energy band gap as a result of electrons release following Burstein-Moss effect. 26 It means oxygen evolution during annealing in vacuum raises the Fermi-level upwards by partially filling the conduction band gap and leads to increase in the band gap. The electrons donated by aluminum and those left behind by oxygen ions via desorption as molecules seem to be different and of opposite nature with regard to changes in the band gap.…”
Section: Optical Behaviormentioning
confidence: 99%
“…The band gap decreases from 3.76 to 3.72 eV as T s increases from 400 to 500 C, this in contrast to our previous report on AZO grown the pulsed laser deposition technique. 22 Fig . 6 shows the effect of T s on the temperature dependence of electrical resistivity for AZO films.…”
Section: Resultsmentioning
confidence: 99%
“…By adding Al, the carrier concentration of ZnO nanostructures were improved because the substitution of Al 3+ at the Zn 2+ site created an extra free carrier in the process (Mridha & Basak, 2007, Fournier et al, 2008. Because of the high electron concentration, this condition reduced the barrier height between the Al-doped ZnO nanorod and the seed layer and between the film and the Al metal contact interface.…”
Section: Aluminium Doping Effectsmentioning
confidence: 99%