2017
DOI: 10.1039/c7ra03568c
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Efficient fabrication methodology of wide angle black silicon for energy harvesting applications

Abstract: In this paper, we report an easy and relatively cost effective fabrication technique of a wide band omnidirectional antireflective black silicon surface based on silicon nanowires (SiNWs).

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Cited by 48 publications
(26 citation statements)
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“…5b with metal-assisted chemical etching (MACE) or laser excimer method. Figure 6 shows exemplary SEM images of such nanowires from our preliminary fabrication trials using the fabrication protocols detailed at [20][21][22] and [23] for MACE and laser excimer, respectively. In Fig.…”
Section: Fabrication Proceduresmentioning
confidence: 99%
“…5b with metal-assisted chemical etching (MACE) or laser excimer method. Figure 6 shows exemplary SEM images of such nanowires from our preliminary fabrication trials using the fabrication protocols detailed at [20][21][22] and [23] for MACE and laser excimer, respectively. In Fig.…”
Section: Fabrication Proceduresmentioning
confidence: 99%
“…One potential solution to overcome this texturing problem is to fabricate a nanostructure on the wafer surface. This nanostructure is commonly called "black silicon" (b-Si) because of the outstanding ability to enhance light absorption rendering the surface visibly black 19,20,21,22,23,24 . High-quality b-Si can be produced by laser texturing 25,26,27,28 and reactive ion etching (RIE) 2930,3132,33,3435 .…”
Section: Introductionmentioning
confidence: 99%
“…The advantage of the proposed structure lies mainly in being an ultra-broad band absorber based completely on one silicon material that absorbs light in a huge band in the MIR spectrum and could be easily fabricated. Silicon nanowires fabrication is well established in literature and could be done using lithography free and low-cost techniques such as metal assisted chemical etching and excimer laser making this structure feasible in terms of less fabrication complexity and low cost 1416 . In addition, the diameters of the nanostructures used in this work are as small as several nanometers and with a maximum of 1.9 µm.…”
Section: Introductionmentioning
confidence: 99%