For
the fabrication of thin-film electronics, conventional physical
vapor deposition (PVD) processes have been widely used to form metal
contacts on various thin films. However, the PVD process, involving
thermally activated high-energy metal atoms, damages the underlying
thin films, severely deteriorating the performance and stability of
the device. The van der Waals (vdW) metal-contact approach has recently
emerged to avoid this issue. By transferring predeposited metal contacts
using vdW interactions, atomically sharp and electronically clean
heterointerfaces can be formed without generating unintended defects.
In this article, we review the fundamentals, processes, and various
applications of the vdW metal-integration approach. The classical
theory of vdW interactions is first reviewed, followed by the introduction
of various approaches for constructing vdW metal contacts on thin
films. Subsequently, the influence of contact configuration on the
performance of various applications is summarized. Finally, the remaining
challenges and prospects are discussed for the practical usage and
versatile application of vdW metal contacts for next-generation electronic
devices.