Metal-to-insulator phase transitions in complex oxide thin films are exciting phenomena which may be useful for device applications, but in many cases the physical mechanism responsible for the transition is not fully understood. Here we demonstrate that epitaxial strain generates local disproportionation of the NiO6 octahedra, driven through changes in the oxygen stoichiometry, and that this directly modifies the metal-to-insulator phase transition in epitaxial (001) NdNiO3 thin films. Theoretically, we predict that the Ni-O-Ni bond angle decreases, while octahedral tilt and local disproportionation of the NiO6 octahedra increases resulting in a small band gap in otherwise metallic system. This is driven by an increase in oxygen vacancy concentration in the rare-earth nickelates with increasing in-plane biaxial tensile strain. Experimentally, we find an increase in pseudocubic unit-cell volume and resistivity with increasing biaxial tensile strain, corroborating our theoretical predictions. With electron energy loss spectroscopy and xray absorption, we find a reduction of the Ni valence with increasing tensile strain. These results indicate that epitaxial strain modifies the oxygen stoichiometry of rare-earth perovskite thin films and through this mechanism affect the metal-to-insulator phase transition in these compounds. PACS numbers: 68.55.Ln, 68.60.Bs, 73.50.-h, 73.20.-r 3 Metal-to-insulator phase transitions (MITs) in strongly-correlated electronic systems are fascinating phenomena which have attracted significant attention for decades [1]. Among complex oxide materials which exhibit MITs are rare-earth nickelates having the generic formula RNiO3, where the rare-earth element (R) is smaller than lanthanum, i.e. R = Pr, Nd ... [2]. The critical temperature of the MIT is dependent on the Ni-O-Ni bond angle: straightening the angle with a larger R cation stabilizes the metallic state over the insulating state and lowers the transition temperature [3-5]. For example, the MIT temperatures in bulk NdNiO3 and SmNiO3 (Ni-O-Ni bond angles of 157.1 and 153.4°, respectively) have been reported to be approximately 200 and 400 K, respectively. It should be also emphasized that a breathing order by disproportionation of the Ni-O bond length plays a crucial role in the MIT [6-10].In RNiO3 thin films, misfit strain arising from a lattice mismatch between the film layer and the underlying substrate affects the lattice volume, electrical conductivity and MIT temperature [11][12][13][14][15][16][17][18]. In particular, films under in-plane tensile strain are more insulating compared to those under in-plane compressive strain. The origin of this interesting phenomenon remains unclear, although a number of mechanisms have been proposed [19][20][21][22][23][24].We also note that the effect of oxygen non-stoichiomety on the MIT has been reported in bulk RNiO3 [25,26].It is widely accepted that epitaxial strain in transition metal oxide films can be accommodated through the formation of oxygen vacancy defects, resulting in offstoi...