Electrical and optical properties of amorphous fluorocarbon films prepared by plasma polymerization of perfluoro-1,3-dimethylcyclohexane

Abstract

The electrical and optical properties of amorphous fluorocarbon films (a-C:F) prepared by plasma polymerization have been investigated. Perfluoro- 1,3-dimenthylcyclohexane was introduced into a parallel plate plasma reactor operating at 13.56 MHz to deposit a-C:F films. Transparent a-C:F films with an F/C ratio of 2 were prepared at lower power densities of 10-300 mW/cm(2) at deposition rates of 4-10 nn/min. The films have a low surface energy of 15 mN/m and are thermally stable up to 210 degrees C. The coatings exhibit low refractive index of 1.38, low dielectric constant of 2.3, and high transmittance in the visible range. The electret properties were evaluated by measuring the decay of a positive surface potential (SPD) on 25 mu m thick a-C:F films. High rf power densities lead to an increased formation of conjugated C-C double bonds affecting the transmittance and SPD characteristic

On the Derivation of Young's Equation for Sessile Drops: Nonequilibrium Effects Due to Evaporation

“…The drop shape was analyzed automatically with homemade software. Perfluoro-1,3-dimethylcyclohexane (Aldrich, 80% technical quality isomeric mixture) was deposited by plasma polymerization to form a hydrophobic film on the surface . The thickness of the perfluorocarbon film was measured by ellipsometry and found to be 50 ± 3 nm.…”

Plasma-Enhanced CVD of Fluorocarbon Thin Films via CF3H/H2 Chemistries

“…The distance between the top and bottom electrodes was 3 cm and 20 C water was circulated through the bottom powered electrode. All the thin films deposited in this study were done so at a power density of 0.263 W/cm 2 A VASE from the J. A. Woollam Co. (Lincoln, Nebraska) was used to determine film thickness, the index of refraction, and the extinction coefficient from 400±1000 nm.…”

“…In all cases the bottom plate was powered with 600 W of RF power (Advanced Energy, Fort Collins, Colorado) and possessed an area of 2280 cm 2 . The distance between the top and bottom electrodes was 3 cm and 20 C water was circulated through the bottom powered electrode.…”

Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C8F18) vapor. II. Dielectric and insulating properties

“…[7][8][9][10][11] Amorphous fluorocarbon polymer films (a-C:F) obtained by plasma enhanced chemical vapor deposition ͑PECVD͒ represent a class of polymers that have excellent electrical and insulating properties, characteristics even better than films made from materials in the same chemical compound family, such as Teflon ® . Because of the potential for wide scale application, these films have attracted a great deal of interest either as interlayer dielectrics in microelectronics, [12][13][14] as biocompatible materials in medicine, [15][16][17] and more recently as electrical insulators in high voltage power devices, 18 -20 coatings in pressuresensitive tapes, 21 and photovoltaic materials in solar cell applications. 22 The film deposition technique as well as the film morphology, structural, and chemical properties of a-C:F films obtained from perfluoro-octane (C 8 F 18 ) vapor precursor were presented in detail in a previous article that will be referred to as Part I in this work.…”