2011
DOI: 10.1002/pssa.201026748
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Electrical characteristics and interfacial reactions of rapidly annealed Pt/Ru Schottky contacts on n‐type GaN

Abstract: The electrical properties and interfacial reactions of Pt/Ru Schottky contacts on n-type gallium nitride (GaN) have been investigated as a function of annealing temperature. The calculated Schottky barrier height (SBH) of the as-deposited Pt/Ru Schottky contact is found to be 0.69 eV current-voltage (I-V) and 0.76 eV capacitance-voltage (C-V). Experimental results showed that the SBHs are increased on increasing the annealing temperature. When the contact is annealed at 600 8C, a maximum barrier height is obta… Show more

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Cited by 9 publications
(1 citation statement)
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“…It is obvious that the obtained GaN film can be etched by KOH, indicating that its lattice polarity is N-polarity. The crystalline quality and surface morphology of the N-polarity GaN can be found in our previous work [23] . The crystalline quality of the N-polarity GaN in our work is comparable to that of metalpolarity GaN, as shown in Table 1.…”
Section: Methodsmentioning
confidence: 96%
“…It is obvious that the obtained GaN film can be etched by KOH, indicating that its lattice polarity is N-polarity. The crystalline quality and surface morphology of the N-polarity GaN can be found in our previous work [23] . The crystalline quality of the N-polarity GaN in our work is comparable to that of metalpolarity GaN, as shown in Table 1.…”
Section: Methodsmentioning
confidence: 96%