Electrical, mechanical, and optical properties of the organic–inorganic hybrid-polymer thin films deposited by PECVD

Bae, I.-S.; Cho, S.-J.; Choi, Won Seok; Hong, Byungyou; Kim, Y.-J.; Kim, Y.-M.; Boo, Jin Hyo

doi:10.1016/j.tsf.2007.08.052

Cited by 23 publications

(11 citation statements)

References 9 publications

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“…However, the applications of the technique have been limited to fields except electronic and photonic devices. For example, the technique to fabricate low‐ k materials (i.e., dielectric materials) has been investigated for minimization of the signal delay in a silicon chip [2] and as protective films for chemical resistance and strong adherence because of the rich cross‐links [3]. The reason, as is generally recognized, is that plasma polymerization is too complex to control the molecular structure.…”

Section: Introductionmentioning

confidence: 99%

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

Moriki

Yumoto

2012

IEEJ Transactions Elec Engng

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An important issue in the polymerization of a polymer film by plasma-enhanced chemical vapor deposition (PECVD) is how to control the polymer structure. As is generally recognized, it is extremely difficult to control the process because it is very complex. For example, various precursors in the plasma arise from fragmentation of source monomers, which can easily change by varying the plasma conditions. High-energy electrons and ions in the plasma bombard the surface of the deposited film and affect the chemical reaction on the film. Moreover, the droplets that arise from the reactor wall by sputtering will accumulate on the film. However, if we aim to fabricate only a photonically functional polymer film, we will be able to find a solution. In this paper, we propose copolymerization from two types of monomers; one type is used as jointing materials by cracking, and the other is used as a photonic functional segment without serious deformation. This difference of action arises from a difference in the formation enthalpy. To confirm this idea, as an initial step, we copolymerized a film from a mixture of benzene (C 6 H 6 ) as the functional segment and cyclohexene (C 6 H 10 ) as the jointing material under the low radio frequency power. The deposited film consists of sp 2 bonding clusters surrounded by sp 3 bonded (alkyl) networks. We confirmed that the sp 2 bonding clusters mostly belong to phenyl, with a few belonging to olefins arising from decomposed C 6 H 6 . In addition, the amount of sp 2 bonding increases proportionally with increasing ratio of C 6 H 6 in the mixture, and the ratio of phenyl in the film becomes comparable to that of polystyrene. From these facts, we speculate that C 6 H 10 acts as the jointing material and C 6 H 6 as the functional segment. Additionally, we introduced tetrafluorocarbon (CF 4 ) to the plasma. CF 4 decomposes with a smaller energy than C 6 H 10 , and it forms mainly fluorine and CF 3 radicals. The fluorine radical pulls out hydrogen from the film and reacts to form dangling bonds in the film. Moreover, we speculate that they will terminate the dangling bonds.

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Section: Introductionmentioning

confidence: 99%

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

Moriki

Yumoto

2012

IEEJ Transactions Elec Engng

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“…Organosilicon thin films, obtained by plasma polymerization in plasma-enhanced chemical vapor deposition (PECVD) systems from precursors containing silicon, are well-known for their wide range of modern technological applications, such as corrosion protective coatings, [1][2][3][4][5] humidity and gas sensing, [6][7][8] hydrophobic layers, 9,10 hard coatings, 11,12 and optical/electrical interlayers. [13][14][15] Hexamethyldisiloxane (HMDSO) is among the frequently used precursors because of its nontoxicity and its relatively low cost. 16 Plasma treatment, depending on the gas type, experimental conditions, and final desired properties, is well established to treat different materials surfaces (polymer, silica, metal oxide, semiconductor, etc).…”

Section: Introductionmentioning

confidence: 99%

“…Organosilicon thin films, obtained by plasma polymerization in plasma‐enhanced chemical vapor deposition (PECVD) systems from precursors containing silicon, are well‐known for their wide range of modern technological applications, such as corrosion protective coatings, humidity and gas sensing, hydrophobic layers, hard coatings, and optical/electrical interlayers . Hexamethyldisiloxane (HMDSO) is among the frequently used precursors because of its nontoxicity and its relatively low cost …”

Section: Introductionmentioning

confidence: 99%

Effect of surface modification on the properties of plasma‐polymerized hexamethyldisiloxane thin films

Saloum

Shaker

Alkafri

et al. 2019

Surface & Interface Analysis

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Plasma‐polymerized hexamethyldisiloxane (pp‐HMDSO) thin films have been deposited in a radiofrequency (RF) remote plasma‐enhanced chemical vapor deposition (PECVD) system, on different types of substrates: silicon wafers, glass, quartz crystals, and chemiresistor structure. The as‐grown thin films have been post treated in two types of reactive plasmas produced in SF6 and O2 gases. The effect of this surface modification on different properties of the as‐grown pp‐HMDSO thin film (chemical structure, elemental composition, surface morphology, film density and thickness, optical bandgap, and electrical resistivity) has been investigated. It is found that SF6 plasma and O2 plasma surface modifications of the as‐grown pp‐HMDSO thin film induce property changes different from each other. SF6 plasma converted the as‐grown pp‐HMDSO film to a more porous material and caused a narrowing of its optical band gap of about 33%, while O2 plasma induced a lowering of film electrical resistivity of about two orders of magnitude.

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“…A number of studies have been conducted in this area. The candidate materials include polynitriles , polyimides , benzocyclobutene resins , poly(binaphthylene ether) , polyquinolines , polynorbornenes , poly(vinylidene fluoride) , and organic–inorganic hybrid polymers .…”

Section: Introductionmentioning

confidence: 99%

Structural analysis and dielectric property of novel conjugated polycyanurates

Zhao

Wang

et al. 2013

Polymer Engineering & Sci

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Structural characterizations reveal that the plasma polymerization of three cyanate ester monomers proceeded mainly via the opening of p-bonds of the cyanate ester functional groups and transforming them to a large p-conjugated structure, which is noticeably different from the conventional thermal or catalytic cyclotrimerization reaction of cyanate ester monomers. The dielectric properties of the resulting plasma thin films were evaluated and results show that the dielectric constant of the three polycyanurate thin films decreased with increasing frequency, while in contrast, the dielectric loss factor increased with the increasing frequency.

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Electrical, mechanical, and optical properties of the organic–inorganic hybrid-polymer thin films deposited by PECVD

Cited by 23 publications

References 9 publications

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

Molecular structure of a random copolymer film by plasma‐enhanced CVD from a mixture of cyclohexa hydrocarbons

Effect of surface modification on the properties of plasma‐polymerized hexamethyldisiloxane thin films

Structural analysis and dielectric property of novel conjugated polycyanurates

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