2014 International 3D Systems Integration Conference (3DIC) 2014
DOI: 10.1109/3dic.2014.7152152
|View full text |Cite
|
Sign up to set email alerts
|

Electrical model and characterization of Through Silicon Capacitors (TSC) in silicon interposer

Abstract: Inspired from Through Silicon Vias (TSVs), Through Silicon Capacitors (TSCs) are newly developed capacitors integrated throughout the silicon interposer. This paper deals with a demonstrator which investigates the first process steps of TSCs. A predictive modeling method of the impedance of large matrices of such components is proposed. The modeling method makes use of 2D/3D parasitic extraction software for the modeling of each parts of the structure. The resulting lumped RLCG parameters are used to generate … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

0
1
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
4
1

Relationship

1
4

Authors

Journals

citations
Cited by 5 publications
(1 citation statement)
references
References 7 publications
0
1
0
Order By: Relevance
“…The previously presented modeling method for radial TSC has been experimentally validated by measurements from 1 kHz to 40 GHz. Large matrices of radial TSC (N > 100 TSCs) realized with a first generation of MIM stack (TiN 200 nm/Al 2 O 3 20 nm/ TiN 200 nm) had been measured and modeled in [12]. New prototypes realized with a second generation of MIM stack (TiN 80 nm/Ta 2 O 5 40 nm/TiN 80 nm/Cu 1.5 μm) have been realized and measured [13].…”
Section: ) Experimental Validationmentioning
confidence: 99%
“…The previously presented modeling method for radial TSC has been experimentally validated by measurements from 1 kHz to 40 GHz. Large matrices of radial TSC (N > 100 TSCs) realized with a first generation of MIM stack (TiN 200 nm/Al 2 O 3 20 nm/ TiN 200 nm) had been measured and modeled in [12]. New prototypes realized with a second generation of MIM stack (TiN 80 nm/Ta 2 O 5 40 nm/TiN 80 nm/Cu 1.5 μm) have been realized and measured [13].…”
Section: ) Experimental Validationmentioning
confidence: 99%