1999
DOI: 10.1080/00150199908014545
|View full text |Cite
|
Sign up to set email alerts
|

Electrical properties of direct deposited piezoelectric thick film formed by gas deposition method annealing effect of the deposited films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

2
37
0

Year Published

2000
2000
2023
2023

Publication Types

Select...
7
2

Relationship

1
8

Authors

Journals

citations
Cited by 47 publications
(39 citation statements)
references
References 5 publications
2
37
0
Order By: Relevance
“…The apparatus used for the AD method was constructed as described by Akedo and colleagues [4,[10][11]. Film deposition was conducted through injection of the synthesized powders mixed with helium as a carrier gas onto SUS304 stainless-steel with 50-mm thickness set in the chamber.…”
Section: Methodsmentioning
confidence: 99%
“…The apparatus used for the AD method was constructed as described by Akedo and colleagues [4,[10][11]. Film deposition was conducted through injection of the synthesized powders mixed with helium as a carrier gas onto SUS304 stainless-steel with 50-mm thickness set in the chamber.…”
Section: Methodsmentioning
confidence: 99%
“…Electrical properties of PZT thick layer Figure 8 shows the P±E hysteresis loop of PZT thick layer deposited by this method [10]. For the sample after anealing at 600°C, the remnant polarization reached 20 25 lC/cm 2 and the coercive ®eld was 35 55 kV/ cm.…”
mentioning
confidence: 99%
“…In the past decade, aerosol deposition has been employed to generate a ceramic coating [17][18][19]. Ceramic submicron particles were sprayed from a nozzle onto the target surface, and then the particles were collided.…”
Section: Introductionmentioning
confidence: 99%