Electrical conductivity s(T) and thermoelectric power S(T) for undoped CdTe and for CdTe doped by 2 mol% Ge, were measured at high Ar pressure up to 1825 and 1525 K, correspondingly. While the s(T) dependencies of both melts indicate their semiconducting behaviour with similar parameters, the S(T) curves revealed a tendency to metalization at 1400 AE 20 K for the pure CdTe melt. The Ge presence prevents the latter process though the critical point where the S(T) dependence changes its slope, demonstrating a structure change of the melt, is the same as for pure CdTe melt. The CdTe + Ge melt shear viscosity measurements upon moderate pressure up to 1400 K gave the possibility to obtain evidence of a finer structure rearrangement of the melt near 1376 and 1400 K.Introduction CdTe is considered as one of a few semiconductors that are not metallized when melted [1] but, similar to those melts, in a certain temperature range demonstrate a postmelting effect due to a gradual transformation of three-dimensional elementary structural units (clusters) to zero-dimensional (atoms, ions) ones [2]. Using ab initio molecular dynamics simulation of liquid CdTe, Godlevsky et al. have suggested in [3] that spatial bond transformation during CdTe cooling occurs via a stage of Te infinite branched chain formation, but the temperature range of this process is unknown. The simulation in [3] was based on an assumption [4] that at a temperature about 120 K higher than the melting point, the liquid phase becomes metallic though there was no experimental evidence for such a transformation. The necessity of a more detailed study of CdTe melt structure rearrangement on a heating arose also from the fact that one (at 1373 AE 1 K) or some (near 1379 AE 1, 1393 AE 1, 1413 AE 1 K) additional endothermic effects occur above the melting point (T m) at certain thermodynamic conditions but their nature is not understood entirely. For this purpose a study of the influence of impurities on the CdTe postmelting effect should be performed. In the present work Ge was chosen as such impurity taking into account its ability to metallize above T m . Besides, CdTe crystals doped by Ge from the melt are high resistive photorefractive material [5]. It is known that the crystal structure and physical properties are related to the melt structure before solidification [6] that, in turn, depends on the thermal history of the melt.As a CdTe + Ge melt structure study by direct diffraction methods is restricted by the high vapour pressure of components, we carried out the investigation of the