“…The parameters usually optimized are separated in two main groups: The ones related to the precursor solution where the salt type and concentration are involved, and the conditions of electrochemical deposition. A list of usual salts employed are AgNO 3 [30][31][32][33][34] for silver NPs; HAuCl 4 [31,35,36] and AuCl 3 [37] for gold NPs; Bi(NO 3 ) 3 [16,38,39] for bismuth NPs; CoCl 2 [40] for cobalt NPs; CuCl 2 [41], CuSO 4 [42], and CuNO 3 [43,44] for copper NPs; NiCl 2 [40,45] and NiSO 4 [46,47] for nickel NPs; PdCl 2 [48][49][50] [30,[52][53][54][55][56], and PtCl 2 [37] for platinum NPs; RhCl 3 [57] for rhodium NPs, etc. Although higher concentrations of precursor allow bigger particles to be obtained, the size and shape are usually controlled electrochemically; so, the precursor concentration usually tends to be high enough to have sufficient material susceptible to be deposited and it is not often optimized [33].…”