“…However, it is very difficult to obtain p-ZnO and intrinsic ZnO (i-ZnO) films, because the ZnO semiconductor naturally exhibits n-type conduction behaviors owing to the low formation energy of shallow donors induced by oxygen vacancies or zinc interstitials [7,8]. Consequently, n-ZnO films were mostly used in various devices by forming heterojunction with other p-type semiconductors [9][10][11]. Among them, in view of the same crystal structure and the similar lattice constant, the structures of the n-ZnO films deposited on the p-GaN-based semiconductors were widely used in various devices [12][13][14].…”