2015
DOI: 10.4139/sfj.66.544
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Electrodeposited<111>-oriented Cu<sub>2</sub>O Photovoltaic Device with Al:ZnO

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Cited by 3 publications
(3 citation statements)
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“…It was noteworthy that these lattice parameter values closely matched the standard lattice parameters listed in the IDSD (98-018-0051) file, which are a = b = 3.250 Å, and c = 5.211 Å. These results indicated a highly crystalline structure and excellent compatibility, particularly in the heterostructure [37]. The XRD pattern and variation results of n-TiO 2 /ZnO bilayer thin films at different spinning speeds are presented in Figure 6 and Table 2, respectively.…”
Section: Structural Properties Of N-tio 2 /Zno Bilayer Thin Filmsupporting
confidence: 71%
See 1 more Smart Citation
“…It was noteworthy that these lattice parameter values closely matched the standard lattice parameters listed in the IDSD (98-018-0051) file, which are a = b = 3.250 Å, and c = 5.211 Å. These results indicated a highly crystalline structure and excellent compatibility, particularly in the heterostructure [37]. The XRD pattern and variation results of n-TiO 2 /ZnO bilayer thin films at different spinning speeds are presented in Figure 6 and Table 2, respectively.…”
Section: Structural Properties Of N-tio 2 /Zno Bilayer Thin Filmsupporting
confidence: 71%
“…It is essential to minimize the lattice mismatch to ensure a proper Cu 2 O stacking process using the electrodeposition method. Therefore, the highoriented (002)-plane of ZnO is indispensable to overcome the lattice mismatch at the heterointerface [37].…”
Section: Optical Properties Of N-tio2/zno Bilayer Thin Filmmentioning
confidence: 99%
“…Aside from inexpensive, Cu 2 O is also nontoxic, has good electron mobility and a fairly minor carrier diffusion length [10]. Since ZnO is hexagonal (wurtzite) and Cu 2 O is cubic (cuprite), both combination thin film layer exhibited a similar hexagonal atomic arrangement at the interface with 7.1% of lattice mismatch [11]. Electrodeposition method is the preferred technique for Cu 2 O deposition because it is economical for preparation of large area film with homogeneity.…”
Section: Introductionmentioning
confidence: 99%