2013
DOI: 10.1007/s00542-013-1746-7
|View full text |Cite
|
Sign up to set email alerts
|

Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
12
0

Year Published

2013
2013
2024
2024

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 22 publications
(12 citation statements)
references
References 4 publications
0
12
0
Order By: Relevance
“…Previous simulations have highlighted that the increases in forced streaming currents by MS acoustics are weak so as to not significantly contribute to fluid transport down high aspect ratio vias (Strusevich et al , 2013). Regardless, increases to plating efficiencies have been observed (Costello et al , 2013).…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…Previous simulations have highlighted that the increases in forced streaming currents by MS acoustics are weak so as to not significantly contribute to fluid transport down high aspect ratio vias (Strusevich et al , 2013). Regardless, increases to plating efficiencies have been observed (Costello et al , 2013).…”
Section: Discussionmentioning
confidence: 99%
“…A candidate method for enhancing the performance of traditional electroplating and providing Cu filling is the introduction of a megasonic (MS; 1 MHz) transducer as a way to induce acoustic streaming to enhance Cu ion transfer. The introduction of megasound has been shown to improve plating speed and filling quality on the electrodeposition of Cu in situations where the ratio between thickness down the via and on the surface is close to 1:1 (Hyde and Compton, 2002; Costello et al , 2013).…”
Section: Introductionmentioning
confidence: 99%
“…A thicker layer is produced at the TSV opening due to high current density, while a thin layer is produced at the bottom. Therefore, various attempts, such as applying low current density, optimizing organic additives in the plating solution, and using megasonic agitation are currently being studied for DC to fill a via with Cu (Choi et al, 2012;Costello et al, 2013). Figure 2 shows different Cu filling behaviours when DC was applied in a plating bath consisting of copper sulfate (CuSO 4 ) and sulfuric acid (H 2 SO 4 ) with appropriate organic additives (Noh et al, 2011).…”
Section: Direct Current Methodsmentioning
confidence: 99%
“…A thicker layer is produced at the TSV opening due to high current density, while a thin layer is produced at the bottom. Therefore, various attempts, such as applying low current density, optimizing organic additives in the plating solution, and using megasonic agitation are currently being studied for DC to fill a via with Cu (Choi et al , 2012; Costello et al , 2013).…”
Section: Direct Current Methodsmentioning
confidence: 99%
“…The hole between the pads (the capture pad and target pad) of the two conductive layers can be drilled by mill or laser, and then coated with conductors by electroplating. The hole should be large enough to enable the deposition process (usually larger than 75 µ m (Costello et al, 2013; Yen et al, 2012)). The two pads should be larger than the through hole to tolerate fabrication errors during drilling.…”
Section: Actuator Designmentioning
confidence: 99%