1994
DOI: 10.1016/0921-5107(94)90083-3
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Electrolyte for electrochemical C-V profiling of InP- and GaAs-based structures

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Cited by 9 publications
(4 citation statements)
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“…In brief, they conclude that the mechanism of diffusion of InP cannot be determined from their data alone, believing however that it will be similar to that operating in GaAs and GaP. This is a parallel mode diffusion with interstitial diffusion being dominant at high concentrations and temperatures [1,2,3,[16][17][18][19][20][21].…”
Section: Previous Work On Inpmentioning
confidence: 99%
“…In brief, they conclude that the mechanism of diffusion of InP cannot be determined from their data alone, believing however that it will be similar to that operating in GaAs and GaP. This is a parallel mode diffusion with interstitial diffusion being dominant at high concentrations and temperatures [1,2,3,[16][17][18][19][20][21].…”
Section: Previous Work On Inpmentioning
confidence: 99%
“…Electrolytes are readily available for ECV profiling for almost all the important semiconductor materials such as silicon (Si) [5,6], silicongermanium [7], silicon carbide [8], gallium arsenide (GaAs), indium phosphide (InP), GaAs and InPbased materials [9], gallium nitride [10,11], zinc selenide [12,13], etc. To the best of our knowledge, there has been no suitable electrolyte and no detailed report available on the successful ECV profiling of aluminium indium arsenide (AlInAs).…”
Section: Introductionmentioning
confidence: 99%
“…As medidas de capacitância fornecem informações sobre densidade de dopagem. O perfil de profundidade é obtido pela corrosão eletrolítica do semicondutor entre as medições de capacitância (62,63). A figura A.…”
Section: A2 Perfil Eletroquímico De Capacitância-tensão (Ecv)unclassified