Electron Emission Properties of Silicon-Rich Silicon Oxide Film Prepared by Reactive Magnetron Sputtering Deposition and Rapid Thermal Annealing

Abstract

Silicon-rich silicon oxide (SRSO) film was prepared through the deposition of SiO x film by radio-frequency reactive magnetron sputtering from a Si target and the subsequent rapid thermal annealing treatment of SiO x film, and planar-type field emission cathodes based on SRSO film were fabricated. The surface morphologies and electron emission properties of the SRSO films deposited under different O 2 /Ar flow ratios were investigated. The experimental results show that a relatively high O 2 /Ar flow ratio during the deposition of SiO x film can lead to the formation of cluster structure in the SRSO film prepared, and the electron emission efficiency of SRSO film rises with the increase of electric field applied. An SRSO-film cathode fabricated under an O 2 /Ar flow ratio of 1:1 with a chamber pressure of 0.21 Pa has an emission current density of 65.61 μA/cm 2 and a corresponding emission efficiency of 0.53% at a bias voltage of 18 V, and it exhibits relatively stable emission and fine emission uniformity.

MIS-Like Structures with Silicon-Rich Oxide Films Obtained by HFCVD: Their Response as Photodetectors

“…Thus, it makes this material very attractive for the manufacture of optoelectronic devices, such as photodetectors, solar cells, and light emitters [ 5 , 6 , 7 ]. The SRO films can be obtained by various techniques, such as sputtering [ 8 , 9 ], plasma-enhanced chemical vapor deposition (PECVD) [ 10 , 11 ], low-pressure chemical vapor deposition (LPCVD) [ 12 , 13 ], and hot filament chemical vapor deposition (HFCVD) [ 14 , 15 ].…”