The performance of Ta 3 N 5 as a photoelectrode for solar water splitting is compromised by the low photovoltage and poor stability. Wang and colleagues reveal that these issues are caused by the growth of a thin oxide layer on the surface. Although self-limiting in nature, this layer pins the Fermi level and leads to almost complete suppression of the photoactivity. The effect is quantitatively measured via X-ray spectroscopy and photoelectrochemical studies. The information sheds light on strategies for improving photoelectrode performance.
SUMMARYTantalum nitride (Ta 3 N 5 ) is a promising photoelectrode for solar water splitting. Although near-theoretical-limit photocurrent has already been reported on Ta 3 N 5 , its low photovoltage and poor stability remain critical challenges. In this study, we used Ta 3 N 5 nanotubes as a platform to understand the origins of these issues. Through a combination of photoelectrochemical and high-resolution electron microscope measurements, we found that the self-limiting surface oxidation of Ta 3 N 5 resulted in a thin amorphous layer (ca. 3 nm), which proved to be effective in pinning the surface Fermi levels and thus fully suppressed the photoactivity of Ta 3 N 5 . X-ray core-level spectroscopy characterization not only confirmed the surface composition change resulting from the oxidation but also revealed a Fermi-level shift toward the positive direction by up to 0.5 V. The photoactivity degradation mechanism reported here is likely to find applications in other solar-to-chemical energy-conversion systems.