Fabrication of heterojunction between 2D molybdenum disulfide (MoS2) and gallium nitride (GaN) and its photodetection properties have been reported in the present work. Surface potential mapping at the MoS2/GaN heterojunction is done using Kelvin Probe Force Microscopy to measure the conduction band offset. Current-voltage measurements show a diode like behavior of the heterojunction. The origin of diode like behavior is attributed to unique type II band alignment of the heterojunction. The photocurrent, photoresponsivity and detectivity of the heterojunction are found to be dependent on power density of the light. Photoresponse investigations reveal that the heterojunction is highly sensitive to 405 nm laser with very high responsivity up to 105 A/W. The heterojunction also shows very high detectivity of the order of 1014 Jones. Moreover, the device shows photoresponse in UV region also. These observations suggest that MoS2/GaN heterojunction can have great potential for photodetection applications.

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In this work, we investigate an unexplored possibility of passivating the charged surface states on AlGaN/GaN high electron mobility transistor (HEMT) heterostructures by using organic molecules. This has further led to remarkable enhancement in the electrical properties of rectifying metal-semiconductor contacts on AlGaN/GaN. Phenol functionalized Zinc metallated-Tetra Phenyl Porphyrin (Zn-TPPOH) organic molecules were adsorbed on AlGaN/GaN via the solution phase to form a molecular layer (MoL). The presence of the MoL was confirmed using X-ray Photoelectron Spectroscopy (XPS). The thickness of the MoL was assessed as ∼1 nm, using Spectroscopic Ellipsometry and cross-sectional Transmission Electron Microscopy. XPS peak-shift analyses together with Kelvin Probe Force Microscopy revealed that the molecular surface modification reduced the surface potential of AlGaN by approximately 250 meV. Consequently, the Barrier height (ideality factor) of Ni Schottky diodes on AlGaN/GaN was increased (reduced) significantly from 0.91 ± 0.05 eV (2.5 ± 0.31) for Ni/AlGaN/GaN to 1.37 ± 0.03 eV (1.4 ± 0.29) for Ni/Zn-TPPOH/AlGaN/GaN. In addition, a noteworthy decrement in the reverse current from 2.6 ± 1.93 μA to 0.31 ± 0.19 nA at −5 V (∼10 000 times) was observed from Current-Voltage (I-V) measurements. This surface-modification process can be fruitful for improving the performance of AlGaN/GaN HEMTs, mitigating the adverse effects of surface states and polarization in these materials.

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