2009
DOI: 10.1016/j.susc.2008.10.042
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Electronic structure of bismuth terminated InAs(100)

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Cited by 12 publications
(9 citation statements)
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“…47,49 The same feature is also present on the Bi terminated surface, which suggests that it originates from the backbonds of the In atoms of the third surface layer, since the dimer bonds of the surface In (or As) dimers break as a consequence of Bi deposition. Similar assumption was also made by Szamota-Leandersson et al 35 The most interesting changes occur in the top of the valence band, presented in Fig. 8.…”
Section: Valence-band Spectroscopysupporting
confidence: 84%
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“…47,49 The same feature is also present on the Bi terminated surface, which suggests that it originates from the backbonds of the In atoms of the third surface layer, since the dimer bonds of the surface In (or As) dimers break as a consequence of Bi deposition. Similar assumption was also made by Szamota-Leandersson et al 35 The most interesting changes occur in the top of the valence band, presented in Fig. 8.…”
Section: Valence-band Spectroscopysupporting
confidence: 84%
“…A similar LEED pattern has also been observed for the Bi-induced InAs(100) surface previously with similar coverage. 34,35 In our experiments, we observed a clear (2 × 6) structure for a number of coverages from 1 ML up to 3 MLs even without annealing, which indicates that the surface has a periodic structure. However, this (2 × 6) pattern does not correspond to an ordered reconstruction, but rather an average over the surface with "meandering" lines.…”
Section: A Leedmentioning
confidence: 49%
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“…12,13 However, Cs/InAs(111)B-(1 Â 1) surface did not induce an accumulation layer near the surface. 14 Szamota-Leandersson et al 15 have observed a charge accumulation layer on the well-ordered InAs(100)-(2 Â 6)/c(2 Â 12) surface, however, not on the poorly ordered layer. In a recent work, 16 they have investigated the Bi-covered InAs(111)B-(2 Â 2) surface using synchrotron radiation photoelectron spectroscopy and LEED techniques.…”
Section: Introductionmentioning
confidence: 99%