Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist

Hirai, Yoshikazu; Sugano, Koji; Tsuchiya, Toshiyuki; Tabata, Osamu

doi:10.1109/jmems.2010.2067202

Cited by 23 publications

(11 citation statements)

References 58 publications

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“…Another unique lithography technique is UV dosage control by a moving-mask lithography ( Figure 15) [45]. The moving-mask lithography was first demonstrated in deep X-ray lithography to realize 3D tall inclined polymethyl methacrylate (PMMA) microstructures [46].…”

Section: Moving-mask Lithography and Maskless Grayscale Lithographymentioning

confidence: 99%

“…The moving-mask technique was then applied to UV lithography to demonstrate unique 3D inclined 50 μm thick positive-tone photoresist microstructures [47]. This technique was again applied to precisely control UV dosage along specific areas of negative-tone photoresist TMMR (Tokyo Ohka Kogyo Company, Ltd., Tokyo, Japan), which is quite similar to SU-8, to demonstrate embedded microfluidic channel in a single moving-mask exposure on a single-layer of photoresist [45]. For example, the moving-mask lithography was utilized to realize lightly exposed semi-cross-linked region in the middle (Figure 15b) and high exposure dose at the side.…”

Section: Moving-mask Lithography and Maskless Grayscale Lithographymentioning

confidence: 99%

“…Exposure dose profile on the photoresist and conceptual illustration of 3D thick microstructures using a negative-tone photoresist: (a) standard photolithography and (b) moving-mask lithography. Reprinted with permission from [45], copyright 2010 IEEE.…”

Section: Moving-mask Lithography and Maskless Grayscale Lithographymentioning

confidence: 99%

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Innovative SU-8 Lithography Techniques and Their Applications

2014

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SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro-and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so.

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Section: Moving-mask Lithography and Maskless Grayscale Lithographymentioning

confidence: 99%

Section: Moving-mask Lithography and Maskless Grayscale Lithographymentioning

confidence: 99%

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Innovative SU-8 Lithography Techniques and Their Applications

2014

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“…To reduce the mask number to one, another technique proposes optimized mask displacements in order to modulate the UV exposure of the SU-8 layer according to a predefined pattern 16 . This method allows the fabrication of microchannels in a single step but requires in exchange complex technical adaptation of the UV lithographic equipment.…”

Section: Introductionmentioning

confidence: 99%

Three-dimensional closed microfluidic channel fabrication by stepper projection single step lithography: the diabolo effect

Larramendy¹,

Mazenq²,

Temple‐Boyer³

et al. 2012

Lab Chip

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Microfluidic devices are currently being used in many types of biochemical microsystems for liquid phase analysis in the frame of medical applications. This paper presents a new technique for the realization of microfluidic channels using SU-8, a commonly used epoxy-based negative photo-resist. These microchannels were fabricated by a single stepper UV-photolithography process. By changing the process parameters, e.g. the optical focus depth and the UV exposure dose, well-defined, covered microchannels with various dimensions and aspect ratios were realized and proven to be effective for the fluid transport by capillarity. This technique can easily be used for the fabrication of microfluidic devices in the microanalysis and lab-on-chip applications realm.

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“…1021Oct. -1028 Toshiyoshi, H., see Lo, C.-Y., JMEMS April 2010 410-418 Tran, H., see Lee, D., JMEMS Oct. 20101260-1263 Tseng, F.-G., see Liou, J.-C., JMEMS Aug. 2010 961-972 Tsuchiya, T., see Hirai, Y., JMEMS Oct. 20101058-1069 Tu, H., see 1400-1408 Turner, B. W., see …”

mentioning

confidence: 99%

2010 Index Journal of Microelectromechanical Systems Vol. 19

2010

J. Microelectromech. Syst.

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Embedded Microstructure Fabrication Using Developer-Permeability of Semi-Cross-Linked Negative Resist

Cited by 23 publications

References 58 publications

Innovative SU-8 Lithography Techniques and Their Applications

Innovative SU-8 Lithography Techniques and Their Applications

Three-dimensional closed microfluidic channel fabrication by stepper projection single step lithography: the diabolo effect

2010 Index Journal of Microelectromechanical Systems Vol. 19

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