Diamond like carbon (DLC) films were deposited by plasma enhanced chemical vapour deposition, whose purpose is in the application of the films to further improve read/write durability of next generation recording discs. The effects of acetylene (C 2 H 2 ) and ethylene (C 2 H 4 ) source gases and deposition parameters on roughness, structure, hardness, resistivity, silicone contamination, glide performance and microcorrosion measurement on the cobalt concentration of DLC films are studied utilising the following equipment: AFM, Raman, nanoindenter, resistivity gauge meter, phase metrics, time of flight SIMS and inductively coupled plasma mass spectroscopy. Results show that the Raman I d /I g ratio, G and D peak wavenumber, hardness, glide noise and avalanche, silicone contamination and cobalt concentration of the C 2 H 4 source gas films are significantly lower than those of C 2 H 2 gas. Diamond like carbon films prepared at the higher gas flow exhibit a lower I d /I g and cobalt concentration. Films deposited with a higher voltage bias and heater power will induce a higher I d /I g and cobalt concentration.