2010 Symposium on VLSI Technology 2010
DOI: 10.1109/vlsit.2010.5556202
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Enabling application-specific integrated circuits on limited pattern constructs

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Cited by 17 publications
(14 citation statements)
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“…This topology has become possible in deeply scaled technology nodes due to the sub20nm regular pattern construct based IC design [10], [11]. LiM yields tremendous benefits at the system level mainly due to two attributes-proximity and flexibility.…”
Section: Logic In Memorymentioning
confidence: 99%
“…This topology has become possible in deeply scaled technology nodes due to the sub20nm regular pattern construct based IC design [10], [11]. LiM yields tremendous benefits at the system level mainly due to two attributes-proximity and flexibility.…”
Section: Logic In Memorymentioning
confidence: 99%
“…Recent studies of sub-20nm CMOS design indicate that memory and logic circuits can be implemented together using a small set of well-characterized pattern constructs [6,7]. Our early silicon experiments in a sub-20nm commercial SOI CMOS process demonstrate that this construct-based design enables logic and bitcells to be placed in a much closer proximity to each other without yield or hotspots pattern concerns.…”
Section: Introductionmentioning
confidence: 95%
“…But the use of commercial SRAM hardware IP is unable to incorporate application-specific customization that are required in the LiM design and also hinders comprehensive design space exploration. LiM physical synthesis is enabled by our smart memory synthesis framework, which is developed from the pattern construct based logic and memory co-design methodology [6,7]. Using this framework, embedded logic in the LiM is synthesized together with the memory cells to a small set of pre-characterized layout pattern constructs.…”
Section: Smart Memory Compilermentioning
confidence: 99%
“…(8) shows that these eight pixels will be contained in the outputs of the above 1 x 8 access memory in most situations. Therefore, the memory architecture needs no change for the vertical parallel backprojection since we just take advantage of the unused memory outputs from the horizontal parallel backprojection.…”
Section: Hili I Iiiiimentioning
confidence: 99%
“…Recent studies of sub-20nm CMOS design indicate that memory and logic circuits can be implemented together using a small set of well-characterized pattern constructs [8], [9]. Our early silicon experiments in a commercial 14nm SOl CMOS process demonstrate that this construct-based design enables logic and bitcells to be placed in a much closer proximity to each other without yield or hotspots pattern con cerns.…”
Section: Introductionmentioning
confidence: 99%