“…For this purpose, we mainly relied on surface sensitive technique such as X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) to characterize the photoimageable thick films in the form of unexposed, exposed and fired patterns. It is opined that such in depth analysis is necessary for the samples having potential applications in flip chip, microwave, and RF circuits (Barnwell and O'Neill, 1997;Barnwell and Wood, 1997). Although number of studies on the weathering of thick films have focused on monitoring the mechanical properties and the surface morphology by using scanning electron microscopy (Ketkar et al, 2006), until now no attempt has been made to carry out XPS and AFM investigations on photoimageable thick film patterns.…”