2009
DOI: 10.1002/pssc.200880800
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Enhanced device performance of GaInN‐based deep green light emitting diodes with V‐defect‐free active region

Abstract: We have performed the epitaxial growth of GaInN based deep green (540–570 nm) light emitting diodes (LEDs) by introducing processes to avoid the formation of V‐defects in the active region of the GaInN/GaN multiple quantum wells. For 541 and 559 nm LED wafers, the light output power (LOP) at 90 A/cm2 reaches as high as 14 and 8 mW, respectively. These values are 4 times larger than those of typical deep green LED wafers with average V‐defect density of 2–5 × 108cm–2. Under pulsed operation (pulse width of 50 μ… Show more

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Cited by 17 publications
(12 citation statements)
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“…[16][17][18][19] However, the output powers at high injection current of these devices currently do not outperform the best devices grown on (0001) planes (c-planes). 2,14,20,21 …”
Section: Introductionmentioning
confidence: 99%
“…[16][17][18][19] However, the output powers at high injection current of these devices currently do not outperform the best devices grown on (0001) planes (c-planes). 2,14,20,21 …”
Section: Introductionmentioning
confidence: 99%
“…LEDs emitting in the green spectrum currently have attained a record 40% internal efficiency. 2 Although it is an incredible statistic, it also indicates that there is still need for improvement. Nanowires offer a method of growing material with a high indium content free of strain related defects on a wider choice of substrates.…”
mentioning
confidence: 98%
“…Common to all, in sequence of growth, is a 2 lm thick n-GaN, 2.5 nm thick unintentionally doped GaInN QWs separated by 20 nm thick GaN barriers, 20 nm thick p-AlGaN, and 200 nm thick p-GaN layers. 17 The number of GaInN/GaN QWs was varied to 8, 25, and 40. By help of an x-ray diffraction analysis of the (0002) superlattice fringes, an InN-fraction x ¼ 0.08 þ/À 0.01 was determined for the Ga 1Àx In x N layers.…”
mentioning
confidence: 99%