2012
DOI: 10.1002/adma.201104398
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Enhancement of Ferroelectric Polarization Stability by Interface Engineering

Abstract: By using theoretical predictions based on first-principle calculations, we explore an interface engineering approach to stabilize polarization states in ferroelectric heterostructures with a thickness of just several nanometers.

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Cited by 127 publications
(105 citation statements)
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“…We can use the relationship between T and the spin current in Eq. (15) to elucidate the origin of the effect. In Fig.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…We can use the relationship between T and the spin current in Eq. (15) to elucidate the origin of the effect. In Fig.…”
Section: Resultsmentioning
confidence: 99%
“…Fairly recently the persistence of ferroelectricity down to nanometer-thick films was confirmed theoretically 9,10 and experimentally 11,12 . Moreover, the ferroelectric polarization can be stabilized and enhanced via lateral strain and/or interface engineering [13][14][15] . These developments have opened new possibilities to use ferroelectric materials as active barriers in ferroelectric and multiferroic tunnel junctions (FTJs and MFTJs) 16,17 .…”
Section: Introductionmentioning
confidence: 99%
“…Moreover, we anticipate the possibility of spin-polarization control over a broader range of values, including a change between positive and negative. This additional tunability can be achieved by changing the doping level on the ferroelectric, as well as using interface engineering to adjust the Schottky barrier at the interface [34,35] and/or enhance ferroelectric polarization stability [36]. The detection of spin polarization may be achieved using methods similar to those adopted in the studies of spin injection into semiconductors [3][4][5][6][7][8].…”
Section: Fig 1 (Color Online)mentioning
confidence: 99%
“…An ultrathin barrier results in a large tunneling current, which facilitates easy signal readout and device scaling. However, serious undesirable effects, including the FE dead layer, 22 pinned interface dipole, [23][24][25] and leakage current, 11,18,26 arise and degrade the device performance.…”
mentioning
confidence: 99%