2008
DOI: 10.1016/j.tsf.2007.11.013
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Epitaxial growth of continuous CeO2(111) ultra-thin films on Cu(111)

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Cited by 91 publications
(103 citation statements)
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“…5 For further details concerning the preparation procedure we refer to the literature. 54,56,57,60 Mg metal (Goodfellow, 99.9%) was deposited from a resistively heated Mo crucible onto the fully stoichiometric CeO 2 film at 300 K. The amount of the deposited material was estimated by the attenuation of the intensity of the Cu 2p 3/2 photoemission signal, acquired using an Al-Ka X-ray source at g = 201. The estimated thickness of Mg was about 0.6 nm.…”
Section: Methodology Experimentalmentioning
confidence: 99%
“…5 For further details concerning the preparation procedure we refer to the literature. 54,56,57,60 Mg metal (Goodfellow, 99.9%) was deposited from a resistively heated Mo crucible onto the fully stoichiometric CeO 2 film at 300 K. The amount of the deposited material was estimated by the attenuation of the intensity of the Cu 2p 3/2 photoemission signal, acquired using an Al-Ka X-ray source at g = 201. The estimated thickness of Mg was about 0.6 nm.…”
Section: Methodology Experimentalmentioning
confidence: 99%
“…Alternatively, a formation of a ceria film that is epitaxially grown on metal substrates has been studied extensively. The substrates used in such researches include Pd(111), 4 Pt(111), [5][6][7] Rh(111), 8 Ni(111), 9 Cu(111), 10,11 and Ru(0001). 9,[12][13][14][15] It has been pointed out that step-edges, kinks, and vacancies are active sites for the catalytic reaction.…”
Section: Introductionmentioning
confidence: 99%
“…The samples were prepared by the deposition of a Pt layer with a nominal thickness of 0.5 nm onto a wellordered 2.5 nm thick CeO 2 A C H T U N G T R E N N U N G (111)/CuA C H T U N G T R E N N U N G (111) film at 300 K. Details of the sample preparation and treatment procedure can be found in the literature. [53][54][55] The Pt/CeO 2 /CuA C H T U N G T R E N N U N G (111) samples were exposed to a collimated supersonic molecular beam (SSMB) of CH 4 at a sample temperature of 100 K. The SSMB was generated from a resistively heated 100 mm molybdenum nozzle at a seeding ratio of 1:10 in a He environment. Previously, the kinetic energy (KE) of CH 4 was determined to be 68 kJ mol…”
mentioning
confidence: 99%
“…The chemical and structural properties of the film were investigated previously. [54,55,74] We have also investigated the growth of Pt nanoparticles on the film by means of scanning tunneling microscopy (STM). [53] It was found that Pt grows in the form of three-dimensional islands with a nucleation density of around 5 10 12 cm À2 under the conditions applied.…”
mentioning
confidence: 99%