Etching of deep grooves for the precise positioning of cleaves in semiconductor lasers

Bowers, John E.; Hemenway, B. R.; Wilt, D. P.

doi:10.1063/1.95609

Cited by 15 publications

(9 citation statements)

References 7 publications

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“…Reactions [1][2][3][4][5] are sufficient to account for the shape of the voltammograms. One could also assume additional steps, such as…”

Section: Resultsmentioning

confidence: 99%

“…In order to find the ratio between the different competitive anodic reactions (i.e., the reactions in Eq. [1], [6][7][8]), atthe photoelectrode, the amount of charge passed in the anodic process (under light) and in the cathodic process (in the dark) was measured. The ratio of the two quantities characterizes the extent of electrode decomposition vs. total photoreaction.…”

Section: Resultsmentioning

confidence: 99%

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Electrochemical Characterization of Photoetching Products of CdSe

Marcu

Tenne

Rubinstein

1986

J. Electrochem. Soc.

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The mechanism of the photoelectrochemical etching (photoetching) of normalCdSe was investigated. The products of the photoetching were analyzed by cyclic voltammetry in a 1.0M normalKCl solution. The layers were grown under various light intensities and solution pH. The influence of other variables, such as the potential of the working electrode and different solution compositions, was evaluated. Energy dispersive x‐ray spectroscopy (EDS) was used to analyze each stage of the process. The results provide further evidence to support our proposed mechanism. It was also found that the surface roughness increases considerably after photoetching. Two methods are described for the determination of the ratio of the surface areas of the chemically and photoelectrochemically etched electrodes. The experimental results are interpreted in terms of a five‐step reaction network. Fitting of the kinetic parameters by means of a computer simulation program produces good matching of the simulated and experimental i‐V curves.

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“…Reactions [1][2][3][4][5] are sufficient to account for the shape of the voltammograms. One could also assume additional steps, such as…”

Section: Resultsmentioning

confidence: 99%

Section: Resultsmentioning

confidence: 99%

Electrochemical Characterization of Photoetching Products of CdSe

Marcu

Tenne

Rubinstein

1986

J. Electrochem. Soc.

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“…Anodic dissolution is used to perform accurate etching over a large range of etching rates and to give a damage-free final surface [6][7][8][9][10][11][12][13][14]. Anodic etching implies combined growth and dissolution of oxide, partly governed by electrochemical parameters [13][14][15][16][17][18][19][20][21][22][23].…”

Section: Introductionmentioning

confidence: 99%

Fabrication of Variable-Thickness Bridge Using YBCO Thin Film

Park¹,

Kobayashi²,

Goto³

1991

Jpn. J. Appl. Phys.

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The etching profiles of n-GaAs electrodes are controlled under laser illumination and anodic polarization. Depending on the incident light power and pH of the solution two etching profiles are obtained: at strong alkali or acid pH the photon flux limits the photodissolution of GaAs. The etching profile is Gaussian, reproducing the photon distribution of the laser. This etching profile is associated with an immediate and constant photocurrent. At intermediate pH, the growth of an oxide layer limits the photodissolution of n-GaAs. Therefore we obtained a flat bottom etching profile related to a decrease of the photocurrent to a steady state.

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“…As in the gas-phase work, the majority of the etching reactions in the liquid phase are photoelectrically driven, giving up to a hundred times enhancement over the dark reaction (Bowers et al 1985). A solar source could be a direct replacement for currently used light sources in such applications if the economic and source availability factors discussed in Section 4.2 can be satisfactorily addressed.…”

Section: Liquid Phase Systemsmentioning

confidence: 99%

“…The materials that have been etched are Si (Bunkin et al 1985), GaAs (Podlesnik et al'1984), InP (Bowers et al 1985), GaP (Johnson and Tisone 1984), CdS (Tenne and Hodes 1983).…”

Section: Liquid Phase Systemsmentioning

confidence: 99%

High-flux solar photon processes: Opportunities for applications

Steinfeld¹,

Coy²,

Herzog³

et al. 1992

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EXECUTIVE SUMMARYThe overall goal of this study was to identify new high-flux solar photon (HFSP) processes which show promise of being feasible and in the national interest. Electric power generation and hazardous waste destruction were excluded from this study at sponsor request.Our specific objectives were: * to survey pertinent information bases; · to construct and assemble in prescribed electronic form a bibliography of relevant literature; * to prepare an initial list of potentially promising HFSP applications; to define a set of criteria for evaluating potential HFSP applications; * to carry out more detailed evaluations of some of the more promising applications; · to provide recommendations on HFSP process applications indicating special promise; * to discuss the status of current relevant research; and * to recommend research needed to advance basic understanding of HFSP applications and to further their potential for practicality.Our approach was to carry out the project with a core team of researchers providing expertise over a broad array of foundational topics, viz., chemical physics, optics, spectroscopy, photochemistry, high-temperature reactions, industrial chemistry, and chemical process engineering. Because of the wide range of scientific and engineering disciplines relevant to the study goals and the relatively short time available for the study, members of the core team carried out intense, round-table discussions with invited experts in a diverse sphere of pertinent disciplines, e.g., pure and applied optics, solar energy, furnace design, combustion, materials science and engineering, etc. Core team members conferred with experts at the Solar Energy Research Institute (SERI) (now known as the National Renewable Energy Laboratory, NREL) and the University of Chicago, and with participants in related studies being conducted by the National Academy of Sciences and SRI International, Inc. PC-compatible software was used to carry out an in-depth survey of post-1985 literature and to assemble in electronic form a bibliographic data base of important publications. Our approach emphasized the importance of delineating critical scientific and engineering foundations for identifying, evaluating, and discriminating among potentially promising options for HFSP applications. For example, limitations on solar photon intensity and wavelength and temporal variations in solar insolation impact process capacity, duty cycle, and controllability. Competition from alternative sources of intense photon fluxes was also considered in some detail. Formal economic and engineering cost estimates were outside our charter, but the study noted the importance of considering both conventional and externalized factors (e.g., environmental impacts, national security, global competitiveness, quality of fossil or other energy displaced) in determining overall costs of HFSP and competing options.Our overall conclusion is that there is promise for new applications of concentrated solar photons, especially in certain aspects of ...

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Etching of deep grooves for the precise positioning of cleaves in semiconductor lasers

Cited by 15 publications

References 7 publications

Electrochemical Characterization of Photoetching Products of CdSe

Electrochemical Characterization of Photoetching Products of CdSe

Fabrication of Variable-Thickness Bridge Using YBCO Thin Film

High-flux solar photon processes: Opportunities for applications

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