Here, we report on the production of nanoripples on the surface of ZnO bulk substrates by ion beam erosion with 20 keV Ar + ions at an oblique incidence (60 • ). The ripple patterns, analyzed by atomic force microscopy, follow a power law dependence for both the roughness and the wavelength. At high fluences these ripples show coarsening and asymmetric shapes, which become independent of the beam direction and evidence additional mechanisms for the pattern development. The shallow damaged layer is not fully amorphized by this process, as confirmed by medium energy ion scattering. A detailed study of the damage-induced changes on the optical properties was carried out by means of spectroscopic ellipsometry. Using a 3-layer model based on Tauc-Lorenz and critical point parameter band oscillators, the optical constants of the damaged layer were determined. The results showed a progressive reduction in the refractive index and enhanced absorption below the bandgap with the fluence.Crystals 2019, 9, 453 2 of 12 with identical crystal structure (wurtzite) and are suitable for applications in optoelectronics, including the fabrication of light emitting diodes and laser diodes [7,8]. However, since commercial GaN-based devices are already available in the global market, considerable interest has shifted to other potential uses of ZnO.The existing reports on the surface modification of ZnO mainly refer to focused ion beams [9] or laser ablation processes [10]. Only recently, some works have reported ripple formation on ZnO when implanting with 10 keV O + ions [11]. More research is needed to understand the physical processes that take place when this kind of radiation resistant material is irradiated, especially with respect to the damage formation and the particular role of preferential sputtering. In this regard, there is also a lack of reliable optical models to explain the evolution of the damage in these semiconductors, which can be helpful to monitor the implantation effects. One technique able to provide such information is spectroscopic ellipsometry (SE), which has been used for the determination of damage profiles in different semiconductors, such as Si [12] or GaAs [13]. However, these models are very specific for every semiconductor and do not take into account the development of very rough surfaces during the implantation: the typical case when producing ripple patterns at high fluences.Considering this scenario, the main goal of this work was to assess the formation of ripple patterns in bulk ZnO by IBS at medium energy (20 keV) using Ar + ions. We analysed the ripple patterns produced by oblique irradiation regarding the roughness, ripple wavelength, and order. In order to evaluate the ion beam modification of the material, we took advantage of SE to model both the optical damage and the roughening of the surface, and to extract the main optical parameters after the irradiation.
Materials and MethodsBulk c-plane one-side polished ZnO crystals (supplied by CrysTec and produced by hydrothermal synthesis, Berli...