Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVI 2019
DOI: 10.1117/12.2525976
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EUV mask feature reconstruction via phase retrieval

Abstract: EUV lithography is the main candidate for patterning of future technology nodes. Its successful implementation depends on many aspects, among which the availability of actinic mask metrology tools able to inspect the patterned absorber in order to control and monitor the lithographic process. In this work, we perform a simulation study to assess the performance of coherent diffractive imaging (CDI) and related phase retrieval methods for the reconstruction of non-trivially shaped and a-periodic nanostructures … Show more

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Cited by 4 publications
(4 citation statements)
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“…5(b,d). The error, defined in (11) and shown in Fig 5(c) shows an overall better reconstruction and convergence when the prior is included in the optimization algorithm. Practically, we have observed the algorithm to converge in about a third of the iterations of the regular PIE.…”
Section: Extrusion Defectsmentioning
confidence: 96%
See 1 more Smart Citation
“…5(b,d). The error, defined in (11) and shown in Fig 5(c) shows an overall better reconstruction and convergence when the prior is included in the optimization algorithm. Practically, we have observed the algorithm to converge in about a third of the iterations of the regular PIE.…”
Section: Extrusion Defectsmentioning
confidence: 96%
“…Ptychography [6] -a lensless imaging method that enables wide field-of-view, high resolution imaging via phase retrieval -is a possible candidate for the inspection of samples, in reflective mode at short wavelengths [7][8][9]. This coherent diffractive imaging (CDI) method has been introduced as a potential actinic inspection tool for EUV mask inspection [10][11][12]. In ptychography a probe sequentially illuminates a given scattering object at partially overlapping positions.…”
Section: Introductionmentioning
confidence: 99%
“…A well known example is the detection of the mirror defect of the Hubble space telescope, 1 but it can also be applied for instance in characterisation of the objective aberration in semiconductor image-based quality tools. 2 Characterisation (and correction) of such aberrations is necessary to increase the inspection tool throughput required in Industry 4.0. 3,4 A big class of PR methods is based on the projections.…”
Section: Introductionmentioning
confidence: 99%
“…In the field of modern advanced optical imaging, wavefront detection is essential for high‐resolution imaging systems design. Phase retrieval [1] has become an important wavefront sensing technique for high‐resolution optical imaging systems [2, 3], which is already used in many advanced imaging systems, such as large aperture high‐resolution space telescope [4–6], optical microscopes [7, 8], X‐ray imaging [9–11], extreme ultraviolet lithography [12], etc. In the field of wavefront sensing, it is well‐known for its very successful application to Hubble space telescope in aberration correction on‐orbit [13].…”
Section: Introductionmentioning
confidence: 99%