EUV source system development update: advancing along the path to HVM

Heights integrated model as instrument for simulation of hydrodynamic, radiation transport, and heat conduction phenomena of laser-produced plasma in EUV applications.

“…Initial conditions (laser parameters, target size, etc.) of our numerical simulations were determined to be close to known experimental data [63][64][65][66].…”

Laser-produced plasma EUV source based on tin-rich, thin-layer targets

“…To overcome this limitation, the usage of an inert gas (Xe) was suggested [17,18]. The maximum conversion efficiencies found so far are 5% for targets containing tin atoms (tin-rich liquid jet) [19], 3% for lithium targets [20], and 1.4% for xenon targets (solidified xenon) [21]. The debris-free double-stream Xe/He gas-puff target reaches 0.43% CE (R. Rakowski, et al, to be published).…”

Tin inventory for HVM EUVL sources

“…It is assumed that the tin flow rate is same as that for the previously reported droplet diameter of 100 µm at 7 kHz. 3 The mass of tin used in radiation is set to the equivalent mass for tin-doped droplet target case. The mass of tin retrieved from the target being shot by laser is 50 % of a whole droplet.…”

“…Tin is one of the most efficient materials for both gas discharge plasma sources and laser produced plasma sources. [1][2][3] Unlike Xenon which was the material commonly investigated for the EUVL source application, recycling of the target materials is not necessary for tin targets because of the cost of the material itself. However, in assessing the benefits of different source architectures, there are large differences in the size of the tin inventory used, and consequences that ensue.…”