a b s t r a c t a r t i c l e i n f oHybrid PVD-PECVD process of titanium sputtering in argon and acetylene atmosphere combines aspects of both conventional techniques: sputtering of titanium target (PVD) and acetylene as a source of carbon (PECVD). This process can be used for preparation of metal carbon nanocomposites (MeC/C(:H)) or DLC layers doped with metal (DLC:Me). The aim of this paper is to describe and understand elementary processes influencing the hybrid PVD-PECVD process. A non-monotonous dependence of cathode voltage and current, total pressure and spectral line intensities on acetylene supply flow is reported. Explanation of nonmonotonous evolutions through the analysis of the target state correlating the process characteristics with properties of coatings prepared by this process is proposed.