2021
DOI: 10.1016/j.tsf.2021.138661
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Evaluation of properties of sputtered Ni/Cu films with different thicknesses of the Cu layer

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Cited by 8 publications
(3 citation statements)
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“…In the dry process, given the typically limited adhesion between the conductive copper layer and the dielectric, an adhesion layer composed of metals, such as titanium and chromium, with a thickness of several 10 nm to several 100 nm is formed on the dielectric via sputtering to enhance adhesion. [18][19][20][21][22][23] Researchers have achieved high adhesion between the COP and the conductive copper layer using copper nitride as an adhesion layer. 24) However, forming a seed layer using a modified layer or an adhesion layer presents the following challenges.…”
Section: Introductionmentioning
confidence: 99%
“…In the dry process, given the typically limited adhesion between the conductive copper layer and the dielectric, an adhesion layer composed of metals, such as titanium and chromium, with a thickness of several 10 nm to several 100 nm is formed on the dielectric via sputtering to enhance adhesion. [18][19][20][21][22][23] Researchers have achieved high adhesion between the COP and the conductive copper layer using copper nitride as an adhesion layer. 24) However, forming a seed layer using a modified layer or an adhesion layer presents the following challenges.…”
Section: Introductionmentioning
confidence: 99%
“…10,11 The vibrating sample (VSM) and superconducting quantum interference device (SQUID) magnetometry techniques are used to measure magnetization and coercivity of MNPs and solid magnetic films. [12][13][14] However, these techniques fail to map the magnetic signals of a single nanoparticle or small MNP clusters distributed on the polymer matrix.…”
Section: Introductionmentioning
confidence: 99%
“…Different annealing times at a constant high temperature [3] and annealing the sample after production at different temperatures [4] can be shown among the physical conditions that the films are exposed to after production. Some of the production parameters are the deposition rate [2], the different temperatures of the substrate [5], and the value of the layer thicknesses [6,7]. Cobalt is frequently used in applications where electrical, mechanical and magnetic properties are prominent and also investigated by many researchers to explore its various physical properties [8][9][10].…”
Section: Introductionmentioning
confidence: 99%