Due to the lowest formation energies,
sulfur vacancies are inevitable
in the vapor-phase chemical vapor deposition (CVD) of MoS2, which act as deep donors and induce midgap defect states, making
the material intrinsically n-type. The postgrowth oxygen passivation
of such defects has been the subject of a large number of recent studies
because passivation of defects augments the photoluminescence quantum
yield by several orders. In this study, by introducing an SiO2/Si wafer in close proximity to the growth substrate, we were
able to supply trace oxygen in situ during the growth while simultaneously
enabling chemisorption of oxygen at defect sites on the basal plane
of large-area MoS2 monolayers. Low-temperature photoluminescence
spectroscopy allowed us to distinguish clearly the nature of oxygen
bonding in defective MoS2 grown with and without the trace
oxygen. Chemisorption of oxygen enabled elimination of defect-related
bound exciton emission at the near band edge transition of MoS2, leading to about 300% enhancement in the photoluminescence.
We observed unusual splitting of the first-order A1g Raman
mode in monolayer MoS2 films when the sulfur vacancies
are not compensated by oxygen. The present study provides new experimental
evidence to better distinguish between chemisorption and physisorption
of oxygen and may serve as an effective way to tune the optical properties
of van der Waals crystals during the large-area CVD process.