2005
DOI: 10.1117/12.632245
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Expanding grayscale capability of direct-write grayscale photomask by using modified Bi/In compositions

Abstract: Bimetallic thin films have been proven to be effective in creating analog direct write grayscale photomasks. DC-sputtered Bi/In or Sn/In oxidizes under laser writing exposure. The optical density decreases from >3OD as deposited to a transparency of <0.22OD at 365 nm with increasing laser power. The bimetallic film has a response curve that is nearly linear for much of the curve, but non-linear at maximum absorption and transmission. In order to create more accurate gray levels, a more gradual OD change versus… Show more

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Cited by 5 publications
(1 citation statement)
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“…The former needs many steps such as film deposition, lithography, etching, resist striping, etc., while the latter processes a very complicated material system used for electron beam, both of which are expensive that limits their industrial applications. Metaltransparent-metallic-oxides (MTMO) were first proposed and experimentally demonstrated by Chapman et al [5] and subsequently explored as grayscale masks [6][7][8][9][10][11][12][13]. In a parallel research Qian Liu et al have been exploring grayscale implementations [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%
“…The former needs many steps such as film deposition, lithography, etching, resist striping, etc., while the latter processes a very complicated material system used for electron beam, both of which are expensive that limits their industrial applications. Metaltransparent-metallic-oxides (MTMO) were first proposed and experimentally demonstrated by Chapman et al [5] and subsequently explored as grayscale masks [6][7][8][9][10][11][12][13]. In a parallel research Qian Liu et al have been exploring grayscale implementations [14][15][16][17][18].…”
Section: Introductionmentioning
confidence: 99%