“…The case may be ascribed to an organic interlayer modifying the effective barrier height by influencing the space charge region of the inorganic substrate [23,54]. Thereby, it is known that the organic film forms a physical barrier between the metal and the Si substrate, preventing the metal from directly contacting the Si surface [17,18,[21][22][23][24][25][26]54]. The methyl violet organic layer appears to cause a significant modification of interface states even though the organic/inorganic interface becomes abrupt and unreactive [17,18,[21][22][23][24][25][26]54].…”