To improve the photocatalytic activity of TiO 2 film, Ti substrates are irradiated by He ions with different incident ion energy, temperature, and fluence. Anatase TiO 2 films are then coated on the plasma-irradiated substrates via chemical vapor deposition followed by calcination. Photocurrent tests and photocatalytic oxidation (PCO) of formaldehyde are used to assess photocatalytic performance. The optimal plasmairradiated samples showed a four times higher photocurrent and a three fold increase in the rate constant of the PCO reaction compared to the TiO 2 coated, untreated control sample. It is found that the enhanced photocatalytic activity and photocurrent are related to the changes of Ti crystal structure and surface morphology through plasma irradiation.
K E Y W O R D Sion bombardment, photocatalytic activity, plasma treatment, TiO 2 film, Ti substrate