2022
DOI: 10.1021/acsphotonics.1c01728
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Extended-SWIR Photodetection in All-Group IV Core/Shell Nanowires

Abstract: Group IV Ge1–x Sn x semiconductors hold the premise of enabling broadband silicon-integrated infrared optoelectronics due to their tunable band gap energy and directness. Herein, we exploit these attributes along with the enhanced lattice strain relaxation in Ge/Ge0.92Sn0.08 core/shell nanowire heterostructures to implement highly responsive room-temperature short-wave infrared nanoscale photodetectors. Atomic-level studies confirm the uniform shell composition and its higher crystallinity with respect to thi… Show more

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Cited by 14 publications
(12 citation statements)
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“…1b. The typical sunburst-like morphology of the Ge 0.90 Sn 0.10 shell, with Sn-rich {112} wide facets and Ge-rich {110} narrow facets 19,26 , is preserved across the entire 250 nm thickness of the shell. The composition of the GeSn shell was characterized using APT measurements, as displayed in Fig.…”
Section: Nanowires Growth and Characterizationmentioning
confidence: 99%
“…1b. The typical sunburst-like morphology of the Ge 0.90 Sn 0.10 shell, with Sn-rich {112} wide facets and Ge-rich {110} narrow facets 19,26 , is preserved across the entire 250 nm thickness of the shell. The composition of the GeSn shell was characterized using APT measurements, as displayed in Fig.…”
Section: Nanowires Growth and Characterizationmentioning
confidence: 99%
“…However, the control of NW orientation, size and distribution face challenge. Choosing Au [ 27 ] or AuAg [ 28 ] as catalyst, controllable GeSn homogeneous [ 29 ] and Ge/GeSn core/shell [ 24 , 30 ] NWs were prepared by chemical vapor deposition. Yet, the use of noble metals may degrade the optical performance of GeSn through inducing deep energy levels in the bandgap of GeSn, similar to the cases in Ge [ 31 ].…”
Section: Introductionmentioning
confidence: 99%
“…Ge 1−x Sn x alloys constitute an emerging class of group IV semiconductors providing a tunable narrow bandgap, which has been highly attractive to implement scalable, silicon-compatible mid-infrared photonic and optoelectronic devices [1]. This potential becomes increasingly significant with the recent progress in nonequilibrium growth processes enabling high Sn content Ge 1−x Sn x layers and heterostructures leading to the demonstration of a variety of monolithic mid-infrared emitters and detectors [2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18]. Notwithstanding the recent developments in device engineering, the impact of structural characteristics on the basic behavior of charge carriers is yet to be fully understood.…”
Section: Introductionmentioning
confidence: 99%