2016
DOI: 10.7567/jjap.55.06gc01
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Extreme-ultraviolet collector mirror measurement using large reflectometer at NewSUBARU synchrotron facility

Abstract: In extreme-ultraviolet (EUV) lithography, the development of high-power EUV sources is one of the critical issues. The EUV output power directly depends on the collector mirror performance. Furthermore, mirrors with large diameters are necessary to achieve high collecting performance and take sufficient distance to prevent heat and debris from a radiation point of the source. Thus collector mirror development with accurate reflectometer is important. We have developed a large reflectometer at BL-10 beamline of… Show more

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Cited by 8 publications
(4 citation statements)
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“…Dark current was 3.7 e − /s/pixel at −7 °C. The sensor's QE was measured at the BL-10 beamline [6][7][8] of the NewSUBARU synchrotron facility (University of Hyogo) same as previous paper. 3) We set the exposure time to 2 ms, for which the signal was not saturated even in the high-gain mode.…”
mentioning
confidence: 99%
“…Dark current was 3.7 e − /s/pixel at −7 °C. The sensor's QE was measured at the BL-10 beamline [6][7][8] of the NewSUBARU synchrotron facility (University of Hyogo) same as previous paper. 3) We set the exposure time to 2 ms, for which the signal was not saturated even in the high-gain mode.…”
mentioning
confidence: 99%
“…25) In the 90-120 eV region, the high-order diffraction light from the monochromator was eliminated using a two molybdenum (Mo) mirror suppressor. 26) In 150-350 eV region, approximately 10% of the high-order diffraction light remained, which could degrade the accuracy of the QE measurement. This high-order diffraction amount was evaluated in the single event experiment as shown in Fig.…”
mentioning
confidence: 99%
“…The diffraction efficiency of the fabricated transmission grating was measured at beamline 10 of the NewSUBARU synchrotron light facility. 31) A schematic view and photograph of the beamline setup are shown in Figs. 4 and 5, respectively.…”
Section: Diffraction Efficiency Measurementmentioning
confidence: 99%