2007
DOI: 10.1007/s10853-007-1628-4
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Fabrication and characterization of Ge nanocrystalline growth by ion implantation in SiO2 matrix

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Cited by 10 publications
(8 citation statements)
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“…225,231,232 Ge easily oxidizes; thus, in the neutral V O defects formed after implantation, Ge is able to substitute the place of Si in either one or two positions and readily desorbs. 233,234 In addition, Ge remains stressed after annealing partly due to incorporation in the matrix material. [234][235][236] Therefore, after annealing, the only PL observed is defect related PL around 350 nm and 450 nm.…”
Section: -19mentioning
confidence: 99%
See 1 more Smart Citation
“…225,231,232 Ge easily oxidizes; thus, in the neutral V O defects formed after implantation, Ge is able to substitute the place of Si in either one or two positions and readily desorbs. 233,234 In addition, Ge remains stressed after annealing partly due to incorporation in the matrix material. [234][235][236] Therefore, after annealing, the only PL observed is defect related PL around 350 nm and 450 nm.…”
Section: -19mentioning
confidence: 99%
“…233,234 In addition, Ge remains stressed after annealing partly due to incorporation in the matrix material. [234][235][236] Therefore, after annealing, the only PL observed is defect related PL around 350 nm and 450 nm. 237 In addition, red PL has been observed for Ge implanted in SiO 2 .…”
Section: -19mentioning
confidence: 99%
“…Since the first observation of strong visible luminescence from porous Si [2] in 1990, many methods such as pulse laser ablation [3], ion implantation [4], spark processing [5], low-pressure chemical vapor deposition [6,7] stained etch [8], electrochemical anodization (ECA) [9], and strain-induced Stranski-Kranstanov (SK) model [10] have been used to prepare Si-based nanostructures to mimic the porous Si, which can give rise to visible luminescence. Although the Si-based nanostructured materials as prepared via the above methods indeed show good optical properties from visible to infrared wavelength, there is still great challenge in further enhancing the optical performance because it is difficult to control size or position of the nanocrystals or to attain high density of the nanocrystals in the structure.…”
Section: Introductionmentioning
confidence: 99%
“…Many methods such as pulse laser ablation [3], ion implantation [4], stained etch [5], electrochemical anodization (ECA) [6], and strain-induced Stranski-Kranstanov (SK) model [7] have been used to prepare Si-based nanostructures. Although the Si-based nanostructured materials possess good optical properties in visible or infrared wavelength range, the great challenge is remaining in further enhancing the optical performance because it is very difficult to control size or position of the nanocrystals or to attain high density of the nanocrystals in the structure.…”
Section: Introductionmentioning
confidence: 99%