Fabrication and characterization of magnetic porous silicon with curie temperature above room temperature

Aouassa, Mansour; Jadli, Imen; Zrir, M.A.; Maâref, H.; Mghaieth, Ridha; Favre, Luc; Ronda, A.; Berbézier, Isabelle

doi:10.1007/s10934-016-0353-2

Cited by 5 publications

(2 citation statements)

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“…The Si nanostructures formed by our procedures have significantly larger dimensions as revealed by AFM image (Figure 7); thus, the quantum confinement effect cannot be suggested as a possible explanation of the observed visible emission. It can be attributed to luminescent defect centers induced by plasma etching of silicon 1,9,43 . The PL spectra don't show a clear correlation between PL intensity and surface roughness; this suggests that PL is not related to S‐ and F‐species.…”

Section: Resultsmentioning

confidence: 96%

“…It can be attributed to luminescent defect centers induced by plasma etching of silicon. 1,9,43 The PL spectra don't show a clear correlation between PL intensity and surface roughness; this suggests that PL is not related to S-and F-species. The "violet" emission was observed from electrochemically etched Si by Chen et al 44 and attributed to surface complexes.…”

Section: Afm Analysismentioning

confidence: 96%

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Study of silicon surface micro‐roughness generated by SF₆ remote plasma etching

Saloum

Zrir

Alkhaled

et al. 2023

Surface & Interface Analysis

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We investigate micro-roughness of silicon surface in remote radiofrequency (RF) SF 6 plasma, for different etching durations. A linear behavior of etching rate is observed as a function of etching time. PL measurements at different temperatures indicate a visible (green and violet) and ultraviolet (UV) emissions. The evolution of surface roughness of Si substrates can be controlled depending on the etching duration.In response to the increase of the etching duration, the surface undergoes nanoscale roughening, ripple formation, and finally microscale roughening. Atomic force microscopy analysis was carried out to surface morphology.

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Section: Resultsmentioning

confidence: 96%