Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist

Abstract

Articles you may be interested inExploring the ultimate resolution of positive-tone chemically amplified resists: 26 nm dense lines using extreme ultraviolet interference lithography J. Vac. Sci. Technol. B 22, 99 (2004); 10.1116/1.1640402 Fabrication of sub-50 nm critical feature for magnetic recording device using electron-beam lithography Magnetic information storage density has increased at the rate of 60% per year for the past seven years. There is wide agreement that continuation of this trend beyond the physical limits of the continuous thin-film media currently used will likely require a transition to discrete, lithographically defined magnetic pillars. Interference lithography ͑IL͒ appears to be the most cost-effective means of producing two-dimensional arrays of such pillars. IL can rapidly expose large areas with relatively simple equipment, without the need for a mask, and with fine control of the ratio of pillar diameter to period. We show that negative-tone imaging yields three times the contrast of positive-tone imaging for the generation of holes in photoresist, suitable for subsequent deposition or electroplating of magnetic material. We use a negative i-line, chemically-amplified resist ͑OHKA THMR-iN PS1͒ to form 200 nm period arrays of magnetic dots in Co and Ni. Such arrays, with a variety of well controlled diameters, are used to study the effect of particle size on magnetic behavior.

Fabrication of submicron metallic grids with interference and phase-mask holography

“…(2) in Ref. 9. The second term is the interference between the first-and zeroth-order diffracted beams, and the last term is between the first-order diffractions.…”

“…14,15 The typical feature shape of a double exposure in interference holography is a cylinder that is circular in the top view. 8,9 However, in this paper we present that two-dimensional (2-D) square metallic mesh structures can be made with two successive fillings in empty channels of the gratings. This process requires an electrodeposition in the channels of the photoresist grating and a second electrodeposition in the channels of the gratings patterned crossed by 90 deg on the first electrodeposited one.…”

“…Holographic interference lithography (HIL) has been widely used in making periodic structures such as gratings, 8 cylindrical pillars, 9 and even complex photonic crystal structures. [10][11][12][13] Interference holography uses an interference pattern rather than a photomask.…”

Laser Interference Lithography and Shadow Lithography for Fabricating Nanowires and Nanoribbons

“…The interference of three coherent beams is the superposition of three plane waves as described in Eq. (3) (De and Sevigny, 1967;Farhoud et al, 1999): …”

Investigation of magnetic interactions in large arrays of magnetic nanowires

“…2 For the fabrication of patterned magnetic media, the main focus is developing synthesis techniques capable of producing features in the nanometer range while having the potential for cost effective mass production. Besides wellestablished methods such as e-beam lithography, 3 a multitude of less conventional approaches that show promise have been investigated including deposition in nanotemplates, 4 lithography assisted self-assembly, 5 and nanoimprint lithography. 6 On the other hand, the magnetic characterization research has concentrated on studying magnetic properties and magnetization switching mechanisms that emerge as the size of the magnetic particles becomes comparable with the exchange length and domain wall thickness.…”