Fabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels

Abstract

Nanoimprint lithography (NIL) is a paradigm-shift method that has shown sub-10-nm resolution, high throughput, and low cost. To make NIL a next-generation lithography tool to replace conventional lithography, one must demonstrate the needed overlay accuracy in multilayer NIL, large-area uniformity, and low defect density. Here, we present the fabrication of 60-nm channel metal–oxide–semiconductor field-effect transistors on whole 4-in. wafers using NIL at all lithography levels. The nanotransistors exhibit excellent operational characteristics across the wafer. The statistics from consecutive multiwafer processing show an average overlay accuracy of 500 nm over the entire 4-in. wafer. The accuracy is much better when the field size is reduced. The overlay accuracies are limited by the current alignment method and can be improved substantially. The work presents a significant advance in nanoimprint development and its applications in manufacturing of integrated electrical, optical, chemical, and biological nanocircuits.

Incorporation of Point Defects into Self‐Assembled Three‐Dimensional Colloidal Crystals

“…Locating an individual point defect of the pointdefect array at a precise position within the self-assembled PC requires NIL with advanced aligning techniques. [32,33] Nevertheless, the relative position of these point defects can be easily controlled with our fabrication method. A method of simultaneously fabricating point and line defects into a self-assembled PC, of which the positions can be tuned precisely by mold design, can be immediately adopted following the work described here.…”

A review of thin-film transistors/circuits fabrication with 3D self-aligned imprint lithography

“…Remarkable progress was made in 1995 when Chou et al demonstrated a nanostructure with 25 nm resolution obtained by nanoimprinting and subsequent pattern transfer [17,18]. Since then, nanoimprinting has attracted great attention for fabricating micro/nanostructures for various applications including magnetic [19,20], electronic [21,22], optical [23,24], and biological devices [25,26]. Based on thermal-NIL, alternative methods have also been demonstrated.…”

High‐Speed Roll‐to‐Roll Nanoimprint Lithography on Flexible Plastic Substrates

“…Among the emerging techniques, nanoimprint lithography (NIL) clearly stands out as a promising technology for high-throughput and highresolution nanometer-scale patterning, [1,2] which can achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in other traditional techniques. Developments in this area have enjoyed great momentum in the past decade and numerous applications, such as in Si electronics, [3,4] organic electronics and photonics, [5,6] magnetics, [7,8] and biology [9][10][11][12] have been exploited by many researchers. On the other hand, the current process and throughput in NIL (on the order of a few minutes per wafer) is still far from meeting the demands of many practical applications, especially in photonics, biotechnology, and organic optoelectronics.…”