“…For example, pulsed laser deposition (PLD), [9] magnetron sputtering, [10] chemical vapor deposition (CVD), [11] plasma-enhanced CVD, [12] solgel method, [13,14] and sol-gel dip coating [15] were used to deposit thin films; hydrothermal process, [16] thermal pyrolysis, [17] electrospinning, [18] ion beam sputtering, [19] and helium (He) plasma treatment [5] were used for nanostructuring.Among these methods, He plasma treatment is a novel method, which forms fiberform nanostructures (FNs) called fuzz on various metals including tungsten, molybdenum, rhenium, rhodium, tantalum, platinum, niobium, and V. [5,[20][21][22][23][24][25] The process is a bottom-up process accompanied by the growth of He bubbles on the top surface layer (thickness of 100-200 nm) and the formation and diffusion of adatoms. [26][27][28][29][30] Application of oxidized fuzz has been studied including the application of tungsten trioxides (WO 3 ) as gas sensors [31][32][33][34][35][36] WO 3 , iron oxides, [37,38] titania, [39,40] and V oxides [5] as photoelectrodes. On the fuzzy oxides, in addition to the increase in the active area to be used for reactions, [38] other positive aspects of the He treatment have been revealed, such as the formation of oxygen vacancies, [36] which can improve photoelectrochemical (PEC) performance, and stabilization of the anatase structure of titania.…”