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Decomposition of ethylene gas by a photocatalyst is an environmentally friendly and sustainable process. We fabricated titanium dioxide thin films deposited on nanostructured tungsten substrates formed by exposure to helium plasma and evaluated their photocatalytic performance. The nanostructures were maintained even after sputtering and annealing, and the proportion of tungsten inside the thin film increased with increasing oxidation temperature. The photocatalytic activity was improved due to formation of the nanostructure.

Ethylene decomposition via photocatalytic reaction using ultra-violet light was performed using an oxidized titanium (Ti) sheet and/or thin film samples fabricated by helium (He) plasmas treatments. We prepared nanostructured Ti samples formed by He plasma irradiation and additional thin film deposited samples using radio frequency magnetron sputtering. The samples prepared in this study had a slightly lower photocatalytic activity compared to the thin film deposited on tungsten nanostructure samples previously reported; the anatase formation was solely identified on Ti sheet samples and is hopeful for further improvement of photocatalytic activity of plasma treated titania.

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In this study, two photosensitive nanostructured photocatalysts (i.e. a nanostructured W sheet (WNano) and a nanostructured W thin film (WNTF), respectively) were fabricated by helium plasma irradiation. In addition, the photocatalytic activity was examined for the degradation of methylene blue under visible light irradiation. The result revealed that the highest photocatalytic activity is observed for WNano subjected to calcination at 573 K. The difference in the photocatalytic activities between WNano and WNTF was possibly caused by the difference in the surface area and the presence of a W/WO3 interface. Among the series of the WNano photocatalysts subjected to calcination at different temperatures, the localized surface plasmon resonance of nanostructured W was likely responsible for photocatalysis.