2008
DOI: 10.1007/s00542-007-0542-7
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Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

Abstract: High focusing efficiency Fresnel zone plates for hard X-ray imaging is fabricated by electron beam lithography, soft X-ray lithography, and gold electroplating techniques. Using the electron beam lithography, Fresnel zone plates which has an outermost zone width of 100 nm and thickness of 250 nm has been fabricated. Fresnel zone plates with outermost zone width of 150 nm and thickness of 660 nm has been fabricated by using soft X-ray lithography.

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Cited by 10 publications
(6 citation statements)
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“…(5) After ion etching for 2 min, circular gold patterns of zone plates with high aspect ratio has been fabricated on the freestanding Si 3 N 4 film. The more detailed fabrication processes can be found in (Liu et al 2008). Using Raith e-LiNE e-beam lithography system, the zone plates mask with outermost zone width of 100 nm was fabricated.…”
Section: Zone Plates' Fabrication Processesmentioning
confidence: 99%
“…(5) After ion etching for 2 min, circular gold patterns of zone plates with high aspect ratio has been fabricated on the freestanding Si 3 N 4 film. The more detailed fabrication processes can be found in (Liu et al 2008). Using Raith e-LiNE e-beam lithography system, the zone plates mask with outermost zone width of 100 nm was fabricated.…”
Section: Zone Plates' Fabrication Processesmentioning
confidence: 99%
“…Moreover, Micro-FAST may be a better way to realize the densification process than SPS does because of the higher pressure applied, e.g., 100 MPa. For most materials, the low sintering temperature and short sintering time can effectively restrain the grain growth and allow the preparation of materials with highdensity and fine crystalline structure [9], [15], [16]. Compared to conventional sintering methods, Micro-FAST is a promising and energy-efficient technique.…”
Section: Process Configurationmentioning
confidence: 99%
“…A LIGA process is based on synchrotron X-ray radiation lithography and galvanoforming [14]. X-ray lithography is a conventional microfabrication technique which is suitable mostly for fabricating polymeric and silicon-based materials [15]. A significant drawback to LIGA is sophisticated equipment and high cost as well as low efficiency.…”
mentioning
confidence: 99%
“…Micro system technology (MST) is one of the leading techniques for producing micro components on the nanometer to millimeter scale [6]. X-ray lithography is a conventional micro fabrication technique suitable for fabricating polymeric and silicon-based materials [7,8]. Other fabrication techniques used include micro electrodischarge machining (EDM) and laser micro machining which can produce a wide range of micro components from a variety of materials [9,10].…”
Section: Introductionmentioning
confidence: 99%