2008
DOI: 10.1063/1.2928234
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Fabrication of graphene p-n-p junctions with contactless top gates

Abstract: We developed a multi-level lithography process to fabricate graphene p-n-p junctions with contactless, suspended top gates. This fabrication procedure minimizes damage or doping to the single atomic layer, which is only exposed to conventional resists and developers. The process does not require special equipment for depositing gate dielectrics or releasing sacrificial layers, and is compatible with annealing procedures that improve device mobility.Using this technique, we fabricate graphene devices with suspe… Show more

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Cited by 137 publications
(147 citation statements)
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“…This feature has been agreed in recent experiments for pn and pnp junctions in MLG. 40,57,58,[60][61][62][63][64] The difference of the conductance, or equivalently the resistance, between the nn and np (or between pp and pn) in experiments is even more obvious possibly due to the smooth interface that leads to an exponentially decaying form of T , 24 as we have reviewed and discussed in Sec. III A 2.…”
Section: B Klein Tunneling In Mlgmentioning
confidence: 99%
“…This feature has been agreed in recent experiments for pn and pnp junctions in MLG. 40,57,58,[60][61][62][63][64] The difference of the conductance, or equivalently the resistance, between the nn and np (or between pp and pn) in experiments is even more obvious possibly due to the smooth interface that leads to an exponentially decaying form of T , 24 as we have reviewed and discussed in Sec. III A 2.…”
Section: B Klein Tunneling In Mlgmentioning
confidence: 99%
“…At constant B, we observe an intriguing "hexagon" patterns in G( ! ,ν) phase diagram, which arises from crossings between symmetry-broken LLs.Dual-gated suspended devices are fabricated using a multi-level lithography technique 41,42 (Fig. 1b).…”
mentioning
confidence: 99%
“…Dual-gated suspended devices are fabricated using a multi-level lithography technique 41,42 (Fig. 1b).…”
mentioning
confidence: 99%
“…The Ti/Al electrodes and Ti suspended top gates 17,18 are fabricated by electron beam lithography. A device schematic is shown in Fig.…”
mentioning
confidence: 99%