2021
DOI: 10.1002/pssa.202000502
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Fabrication of n‐Type Doped V‐Shaped Structures on (100) Diamond

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Cited by 7 publications
(5 citation statements)
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“…Using a high concentration of phosphorous dopants (shallow activation energy level than nitrogen) (10 22 cm −3 ) improved the properties of the n-type layer [ 12 ]. Diamond orientation <100> was used to grow this n-type layer [ 13 , 259 ]. Several reports described the development of high quality p-n [ 260 , 261 ] and p-i-n [ 262 ] diamond junctions.…”
Section: Diamond-based High-power Electronic Devicesmentioning
confidence: 99%
“…Using a high concentration of phosphorous dopants (shallow activation energy level than nitrogen) (10 22 cm −3 ) improved the properties of the n-type layer [ 12 ]. Diamond orientation <100> was used to grow this n-type layer [ 13 , 259 ]. Several reports described the development of high quality p-n [ 260 , 261 ] and p-i-n [ 262 ] diamond junctions.…”
Section: Diamond-based High-power Electronic Devicesmentioning
confidence: 99%
“…61 Metal-catalyzed diamond etching has been applied to design and microfabricate patterns on diamond surface. Christoph Schreyvogel et al 180 have fabricated structures with V-shape (100)-oriented diamond. With photolithography and electron beam evaporation, they fabricated square-shaped Ni masks with 5 × 5 and 10 × 10 μm on diamond surface.…”
Section: Metal-catalyzed Transitionmentioning
confidence: 99%
“…8e). [36][37][38][39] Finally, metal deposition and the annealing are performed to form the source and drain ohmic contacts (Fig. 8f).…”
Section: Device Mechanism and Performancesmentioning
confidence: 99%