2016
DOI: 10.1016/j.proeng.2016.11.369
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Fabrication of Ultrathin Large-area Dielectric Membrane Stacks for use as Interference Filters

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Cited by 3 publications
(2 citation statements)
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“…For optimal performance, a high level of parallelism between the DBRs is required, typically better than λ∕10 or λ∕20 for MEMS-based optical applications. [43][44][45][46] Our efforts in this work culminate in fabricating layers with mirror parallelism exceeding a level of λ∕200 for the suspended mirror layers. This work provides reliable and reproducible methods to develop high performing surface micromachined DBRs for the MWIR and LWIR wavelength regions using thermally evaporated BaF 2 as a low refractive index material and their suitability in the development of MEMS-based optical FPIs.…”
Section: Introductionmentioning
confidence: 99%
“…For optimal performance, a high level of parallelism between the DBRs is required, typically better than λ∕10 or λ∕20 for MEMS-based optical applications. [43][44][45][46] Our efforts in this work culminate in fabricating layers with mirror parallelism exceeding a level of λ∕200 for the suspended mirror layers. This work provides reliable and reproducible methods to develop high performing surface micromachined DBRs for the MWIR and LWIR wavelength regions using thermally evaporated BaF 2 as a low refractive index material and their suitability in the development of MEMS-based optical FPIs.…”
Section: Introductionmentioning
confidence: 99%
“…Suspended SiO 2 structures are important for a number of optical and photonic integrated circuit (PIC) applications such as broad spectra frequency combs [ 1 ], low propagation loss waveguides [ 2 ], and UV–visible optical filters [ 3 ]. In addition to these applications, suspended waveguides can be applied to UV absorption spectroscopy and an emerging class of gallium nitride (GaN) nanowire-based photonic devices that could benefit from UV transparent waveguides—including near-field scanning optical microscopy (NSOM), vertical cavity lasers, and direct write lithography [ 4 , 5 ].…”
Section: Introductionmentioning
confidence: 99%