Facility with hybrid plasma reactor

Ayrapetov, A. A.; Kralkina, E.A.; Neklyudova, P. A.; Odinokov, V. V.; Pavlov, V.B.; Pavlov, G. A.; Sologub, V. A.

doi:10.22184/1993-8578.2016.70.8.104.108

Cited by 4 publications

(2 citation statements)

References 2 publications

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“…The additional threeelectrode plasma arc source (4) has parameters similar to those of gas plasma flows that are generated in the helicon source. Such a source was described previously in [71]. It forms the directed ion plasma flow with the ion current density up to 50 mA cm −2 and ion energies up to 100 eV.…”

Section: Experimental Equipment and Research Methodsmentioning

confidence: 99%

Effect of trampoline sputtering on surface morphology and coatings properties

Gabovich¹,

Semeniuk²,

Semeniuk³

2021

J. Phys. D: Appl. Phys.

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The collective trampoline ion-plasma effect was used to modify surface properties of metals, ceramics, silicon and carbon in a desired manner. The rough surfaces created by low-energy dense ion flows were demonstrated to include double-level hierarchical structures. Namely, the submicron and nanoscale peaks and valleys were found. The coating films were deposited by the nanoclusters emitted in the trampoline mode, as well as by plasma-enhanced chemical vapor deposition (PECVD) and physical vapor deposition (PVD) methods. The substrates were prepared by prior ion processing in the trampoline mode. Preliminary nanoscale texturing of surfaces substantially modified the interaction of ion-plasma flows with surfaces during the subsequent film formation by PVD and PECVD techniques. The so created rough surface showed the strong film adhesion and a 25%–50% faster film formation during ion-plasma deposition as compared to the case of a non-textured surface. The transfer of target material in the form of nanoclusters allowed obtaining dense defect-free micron-scale films. The submicron structure leads to the infrared and visible light trapping. The results were analyzed on the basis of the previously suggested qualitative model of the trampoline sputtering.

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Section: Experimental Equipment and Research Methodsmentioning

confidence: 99%

Effect of trampoline sputtering on surface morphology and coatings properties

Gabovich¹,

Semeniuk²,

Semeniuk³

2021

J. Phys. D: Appl. Phys.

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“…In [14], the possibility of generating plasma flows with the ion component density of up to 20-30 mA/cm 2 and independently controlled ion energy within the range of 20-120 eV by using a combination of arc discharge with inductive radiofrequency (RF) discharge in external magnetic field is shown. The results obtained in [14] served as the starting point for the development of a plasma reactor [15][16][17][18], intended for the magnetron sputtering of functional coatings using stimulation by ions, generated in RF inductive discharge with external magnetic field.…”

Section: Introductionmentioning

confidence: 99%

Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

Kralkina¹,

Alexandrov²,

Nekludova³

et al. 2019

Micromachining

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The results of the study of the plasma reactor on the combined magnetron discharge and radio-frequency (RF) inductive discharge located in the external magnetic field are presented. Magnetron discharge provides the generation of atoms and ions of the target materials, while the flow of accelerated ions used for the ion assistance is provided by the RF inductive discharge located in an external magnetic field. Approaching the region of resonant absorption of RF power by optimizing the magnitude and configuration of the external magnetic field makes it possible to obtain a uniform within 10% radial distribution of the ion current across the diameter of 150 mm. When the RF power supply power is 1000 W, the ion current density on the substrate can be adjusted in the range of 0.1-3 mA/cm 2. The use of ion assisting results in a fundamental change in the structure and properties of functional coatings, deposited using a magnetron.

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Electric properties of carbon films deposited by magnetron sputtering with ion assistance

Grushin

Kralkina

Neklyudova

et al. 2019

J. Phys.: Conf. Ser.

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The paper deals with the study of ion assistance impact on structure and electrophysical properties of the carbon films deposited by magnetron sputtering of graphite targets. The flow of assisting ions was generated in the plasma reactor based on inductive RF discharge located in the external magnetic field. The change of the ionic current density in the range from 0.5 to 1 mA/cm2 was provided. Ion energy was changed by biasing the substrate in the range from 10 to 85 V. Neon, argon and krypton were used as working gases. The electrophysical properties of carbon films are shown to depend non-monotonous on energy of the assisting ions.

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Facility with hybrid plasma reactor

Cited by 4 publications

References 2 publications

Effect of trampoline sputtering on surface morphology and coatings properties

Effect of trampoline sputtering on surface morphology and coatings properties

Physical Processes and Plasma Parameters in a Radio-Frequency Hybrid Plasma System for Thin-Film Production with Ion Assistance

Electric properties of carbon films deposited by magnetron sputtering with ion assistance

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