Faraday Cup Designs for Ion Implantation

On-line ion implantation for quantification in secondary ion mass spectrometry: determination of trace carbon in thin layers of silicon

“…Interpreting the success of the quantitative result of this experiment includes consideration of the accuracy of the external standard reference concentration, despite the fact that a dose measurement error of >107c is not expected from the off-line implanter counting system (9,14). The Si[10o] crystalline matrix may have induced channeling and hence distortion of the external standard ion implant distribution, for which a Gaussian distribution was assumed.…”